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US 12,753,970 B2Granted
Substrate treating apparatus
AssigneeSemes Co., Ltd.
InventorsYong Joon Im, Sang Min Lee, Jong Doo Lee, Jin Se Park
Life of this patent
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Abstract
The present invention provides a substrate treating apparatus, including: a housing including a first body and a second body which are combined with each other to provide a treatment space in which a substrate is treated; an actuator which moves the second body in a vertical direction with respect to the first body to seal or open the treatment space; and a pipe which is coupled with the second body and in which a fluid flows, in which the pipe is a stretchable pipe that is stretchable and contractible according to the vertical movement of the second body.
Claims15
A substrate treating apparatus, comprising:
- a housing including a first body and a second body which are combined with each other to provide a treatment space in which a substrate is treated;
- an actuator which moves the second body in a vertical direction with respect to the first body to seal or open the treatment space;
- and
- a pipe which is coupled with the second body and in which a fluid flows,
- wherein the pipe includes a stretchable pipe that is stretchable and contractible according to the vertical movement of the second body,
- wherein the stretchable pipe is a coil pipe and is configured to maintain structural and sealing integrity during thermal and pressure cycling in a supercritical state, and
- wherein the pipe includes a pressure reducing valve configured to selectively discharge the fluid from the treatment space, and a pressure adjusting valve configured to regulate a discharge flow rate to maintain a set pressure in the treatment space during expansion and contraction of the coil pipe caused by vertical movement of the second body, and
- wherein the pipe includes a discharge pipe configured to discharge the fluid from the treatment space, and the coil pipe is located at the discharge pipe, and
- wherein an upper end of the coil pipe is located upstream of the discharge pipe than the lower end of the coil pipe.
6 more elements
A substrate treating apparatus, comprising:
- a housing provided with a first body and a second body which are combined with each other to form a treatment space in which an organic solvent remaining on a substrate is dried by a fluid for drying in a supercritical state;
- an actuator configured to move up and down the second body with respect to the first body to seal or open the treatment space;
- a support unit configured to support the substrate within the treatment space;
- a discharge pipe coupled to the second body to discharge the fluid for drying in the supercritical state from the treatment space, wherein the discharge pipe includes a coil pipe that is stretchable and contractible according to the up and down movement of the second body;
- and
- an upper end of the coil pipe is located upstream of the discharge pipe than a lower end of the coil pipe when the second body moves up and seals the treatment space,
- wherein the coil pipe is configured to maintain structural and sealing integrity during thermal and pressure cycling in the supercritical state, and
- wherein the discharge pipe includes a pressure reducing valve configured to selectively discharge the fluid from the treatment space, and pressure adjusting valve configured regulate a discharge flow rate to maintain a set pressure in the treatment space during expansion and contraction of the coil pipe caused by vertical movement of the second body, and
- wherein the pipe includes a discharge pipe configured to discharge the fluid from the treatment space, and the coil pipe is located at the discharge pipe, and
- wherein an upper end of the coil pipe is located upstream of the discharge pipe than the lower end of the coil pipe.
7 more elements
A substrate treating apparatus, comprising:
- a housing provided with a first body and a second body which are combined with each other to form a treatment space in which an organic solvent remaining on a substrate is dried by a fluid for drying in a supercritical state;
- an actuator configured to move up and down the second body with respect to the first body to seal or open the treatment space;
- a support unit configured to support the substrate within the treatment space;
- a supply pipe coupled to the second body to supply the fluid for drying in the supercritical state to the treatment space, wherein the supply pipe includes a coil pipe that is stretchable and contractible according to the up and down movement of the second body;
- and
- an upper end of the coil pipe is located upstream of the supply pipe than a lower end of the coil pipe when the second body moves up to seal the treatment space,
- wherein the coil pipe is configured to maintain structural and sealing integrity during thermal and pressure cycling in the supercritical state, and
- wherein the supply pipe includes a pressure reducing valve configured to selectively discharge the fluid from the treatment space, and pressure adjusting member configured to regulate a discharge flow rate to maintain a set pressure in the treatment space during expansion and contraction of the coil pipe caused by vertical movement of the second body.
5 more elements
Dependencies are inferred from the claim text.