C23C 16/45572
Cooled nozzles
Official title: {Cooled nozzles}
C23C16/45572 (Cooled nozzles) appears on 205 US grants and 261 published applications in this corpus.
Search patents in C23C- Granted patents
- 205
- Published applications
- 261
- Assignees
- 112
- Inventors
- 747
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 6 | 0 |
| 1998 | 3 | 0 |
| 1999 | 13 | 0 |
| 2000 | 13 | 0 |
| 2001 | 11 | 6 |
| 2002 | 10 | 8 |
| 2003 | 7 | 11 |
| 2004 | 2 | 7 |
| 2005 | 6 | 10 |
| 2006 | 2 | 3 |
| 2007 | 2 | 8 |
| 2008 | 1 | 10 |
| 2009 | 2 | 19 |
| 2010 | 3 | 9 |
| 2011 | 4 | 10 |
| 2012 | 9 | 13 |
| 2013 | 0 | 11 |
| 2014 | 11 | 10 |
| 2015 | 6 | 10 |
| 2016 | 13 | 8 |
| 2017 | 8 | 9 |
| 2018 | 3 | 9 |
| 2019 | 5 | 11 |
| 2020 | 11 | 15 |
| 2021 | 12 | 8 |
| 2022 | 7 | 12 |
| 2023 | 9 | 14 |
| 2024 | 10 | 12 |
| 2025 | 6 | 14 |
| 2026 | 3 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Wall-cooled gas-inlet element for a CVD reactor28 Jul 2026US 12,692,602 B2Aixtron SE
- Chemical vapor deposition apparatus with multi-zone injection block24 Mar 2026US 12,584,223 B2Veeco Instruments Inc.
- Member for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus3 Feb 2026US 12,542,258 B2Mitsubishi Materials Corporation
- Split showerhead cooling plate30 Dec 2025US 12,509,772 B2Lam Research Corporation
- Thermally controlled chandelier showerhead2 Dec 2025US 12,486,574 B2Lam Research Corporation
- A method of forming a graphene layer structure and a graphene substrate6 Aug 2026US 2026/0226652 A1Paragraf Limited
- Showerhead assembly for distributing a gas within a reaction chamber and a method for controlling the temperature uniformity of a showerhead assembly30 Apr 2026US 2026/0117379 A1ASM IP Holding B. V.
- Film forming apparatus19 Mar 2026US 2026/0078486 A1SCREEN Holdings Co., Ltd.
- Multizone thermally controlled showerhead1 Jan 2026US 2026/0002260 A1ASM IP Holding B. V.
- Methods and apparatus for thermal uniformity4 Dec 2025US 2025/0369119 A1ASM IP Holding B. V.
Most cited
By later US patents
- Shower head and film forming apparatus using the same883US 5,595,606 ATokyo Electron Limited · 1997
- Process feed management for semiconductor substrate processing741US 9,017,481 B1ASM America, Inc. · 2015
- Programmable multizone gas injector for single-wafer semiconductor processing equipment740US 5,453,124 ATexas Instruments Incorporated · 1995
- Reactant gas ejector head595US 5,950,925 AEbara Corporation · 1999
- Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system572US 6,635,117 B1Axcelis Technologies, Inc. · 2003