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US 12,542,258 B2Granted
Member for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus
AssigneeMitsubishi Materials Corporation
InventorsFumiaki Ishikawa, Yuto Kurata, Tsukasa Yasoshima, Ichiro Shiono, Takuma Katase
Life of this patent
Estimating the term…
Abstract
A member for a plasma processing apparatus includes a base material and a heat transfer layer provided on one surface of the base material, and the heat transfer layer contains at least one of a fluorine-based resin and a fluorine-based elastomer.
Claims20
A member for a plasma processing apparatus comprising:
- a base material;
- and
- a heat transfer layer provided on one surface of the base material, wherein
- the heat transfer layer contains a fluorine-based elastomer,
- the fluorine-based elastomer is a fluorine-containing three-dimensional crosslinkable compound having a fluorine-containing group and a three-dimensional crosslinked structure,
- the fluorine-containing group is either one or both of a perfluoroalkylene group and a perfluoropolyether group, and
- the three-dimensional crosslinked structure is either one of an epoxy structure having an epoxy bond or a urethane structure having a urethane bond.
4 more elements
A method for manufacturing a member for a plasma processing apparatus comprising:
- a preparation step of preparing a base material;
- a coating step of applying a coating composition containing a fluorine-based compound that produces a fluorine-based elastomer to one surface of the base material by heating or irradiation with ultraviolet rays to form a coating layer;
- and
- a heat transfer layer forming step of heating the coating layer or irradiating the coating layer with ultraviolet rays to produce a heat transfer layer containing the fluorine-based elastomer, wherein
- the fluorine-based elastomer is a fluorine-containing three-dimensional crosslinkable compound having a fluorine-containing group and a three-dimensional crosslinked structure,
- the fluorine-containing group is either one or both of a perfluoroalkylene group and a perfluoropolyether group, and
- the three-dimensional crosslinked structure is either one of an epoxy structure having an epoxy bond or a urethane structure having a urethane bond.
4 more elements
A plasma processing apparatus comprising:
- an electrode plate for a plasma processing apparatus having a vent hole through which a gas for plasma generation passes;
- and
- a focus ring, wherein
- the focus ring or each of both of the electrode plate for a plasma processing apparatus and the focus ring includes a heat transfer layer, and
- the heat transfer layer contains a fluorine-based elastomer,
- the fluorine-based elastomer is a fluorine-containing three-dimensional crosslinkable compound having a fluorine-containing group and a three-dimensional crosslinked structure,
- the fluorine-containing group is either one or both of a perfluoroalkylene group and a perfluoropolyether group, and
- the three-dimensional crosslinked structure is either one of an epoxy structure having an epoxy bond or a urethane structure having a urethane bond.
5 more elements
Dependencies are inferred from the claim text.