Film forming apparatus

A film forming apparatus comprising:

• a chamber;
• a mounting table provided in said chamber and on which a substrate is mounted;
• and
• a fluid head provided at a position facing a first main surface of said substrate placed on said mounting table in said chamber,
• wherein said fluid head includes:
• one or more first inflow port;
• a plasma chamber into which a first source gas flows through said first inflow port;
• a plasma source that plasmatizes said first source gas in said plasma chamber;
• a plurality of first outflow ports that communicate with said plasma chamber, are two-dimensionally dispersively arrayed in an overlapping region overlapping with said first main surface of said substrate in plan view, and allow active species generated by plasmatization of said first source gas to flow out toward said first main surface of said substrate;
• one or more second inflow port;
• a gas flow path into which a second source gas flows through said second inflow port and which is partitioned from said plasma chamber;
• and
• a plurality of second outflow ports that communicate with said gas flow path, are two-dimensionally dispersively arrayed at positions different from said plurality of first outflow ports in said overlapping region, and allow said second source gas to flow out toward said first main surface of said substrate.