C23C 16/45559
Diffusion of reactive gas to substrate
Official title: {Diffusion of reactive gas to substrate}
C23C16/45559 (Diffusion of reactive gas to substrate) appears on 99 US grants and 133 published applications in this corpus.
Search patents in C23C- Granted patents
- 99
- Published applications
- 133
- Assignees
- 69
- Inventors
- 372
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 2 | 2 |
| 2004 | 0 | 1 |
| 2005 | 0 | 2 |
| 2006 | 2 | 1 |
| 2007 | 1 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 1 |
| 2010 | 1 | 4 |
| 2011 | 0 | 3 |
| 2012 | 1 | 1 |
| 2013 | 0 | 0 |
| 2014 | 2 | 2 |
| 2015 | 4 | 3 |
| 2016 | 1 | 6 |
| 2017 | 2 | 8 |
| 2018 | 0 | 4 |
| 2019 | 3 | 26 |
| 2020 | 14 | 11 |
| 2021 | 8 | 10 |
| 2022 | 14 | 10 |
| 2023 | 5 | 9 |
| 2024 | 12 | 18 |
| 2025 | 13 | 8 |
| 2026 | 7 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Cooling frame for diffuser22 Sep 2026US 12,742,239 B2APPLIED Materials.Inc.
- Minimization of chemical vapor infiltration tooling hole length through counterbores11 Aug 2026US 12,703,915 B2Rtx Corporation
- Thin film deposition method28 Jul 2026US 12,692,597 B2Jusung Engineering Co., Ltd.
- Condensate precursors and contaminant purge apparatus and methods28 Jul 2026US 12,695,052 B2FEI Company
- Transition metal deposition method19 May 2026US 12,630,924 B2ASM IP Holding B. V.
- Plenum driven hydroxyl combustion oxidation4 Jun 2026US 2026/0152851 A1APPLIED Materials.Inc.
- Gas diffusion assembly, gas intake device, and substrate processing device9 Apr 2026US 2026/0098339 A1Swaysure Technology Co., Ltd.
- Semiconductor manufacturing multi-zone showerhead4 Dec 2025US 2025/0369117 A1APPLIED Materials.Inc.
- Baffle plate for controlling wafer uniformity and methods for making the same6 Nov 2025US 2025/0343033 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Diffuser for uniform gas delivery in cross-flow reactors23 Oct 2025US 2025/0327182 A1ASM IP Holding B. V.
Most cited
By later US patents
- Gas supply device503US 8,945,306 B2Tokyo Electron Limited · 2015
- Apparatus for chemical vapor deposition426US 8,980,006 B2DMS Co., Ltd. · 2015
- Atomic layer deposition183US 6,585,823 B1ASM International N.V. · 2003
- Systems and methods for internal surface conditioning in plasma processing equipment149US 9,355,922 B2APPLIED Materials.Inc. · 2016
- Chemical vapor deposition wafer boat146US 4,694,778 AAnicon, Inc. · 1987