Gas diffusion assembly, gas intake device, and substrate processing device

A gas intake device, applied for introducing gas into a reaction chamber, comprising:

• a gas distributor, comprising a gas inlet end and a gas outlet end, wherein the gas outlet end comprises a middle gas outlet and a plurality of outer gas outlets, two of the plurality of outer gas outlets are respectively provided at two opposite sides of the middle gas outlet in a width direction of the middle gas outlet, the gas inlet end comprises a first pipe interface and a second pipe interface, the first pipe interface is in communication with the middle gas outlet, and the second pipe interface is in communication with the plurality of outer gas outlets;
• and
• a gas diffusion assembly comprising a guider;
• wherein a first end of the guider in a length direction of the guider is configured for connecting with the gas outlet end, and a second end of the guider in the length direction of the guider is configured for connecting with the reaction chamber;
• the guider comprises a middle flow channel corresponding to the middle gas outlet and a plurality of outer flow channels corresponding to the plurality of outer gas outlets, and two of the plurality of outer flow channels are respectively provided at two opposite sides of the middle flow channel in a width direction of the middle flow channel;
• and the plurality of outer flow channels and the middle flow channel extend in parallel along the length direction of the guider, and a width ratio of each outer flow channel to the middle flow channel is 40±10:20±20.

A substrate processing device, comprising:

• a reaction chamber;
• a base, provided in the reaction chamber, wherein the base is configured for holding a substrate, and the base is capable of rotating synchronously with the substrate;
• a gas intake device, provided at one side of the reaction chamber, configured for introducing gas into the reaction chamber along a first direction parallel to the substrate;
• and
• an auxiliary gas intake device, configured for introducing gas along a second direction parallel to the substrate, wherein the second direction is perpendicular to the first direction;
• wherein the gas intake device comprises:
• a gas distributor, comprising a gas inlet end and a gas outlet end, wherein the gas outlet end comprises a middle gas outlet and a plurality of outer gas outlets, two of the plurality of outer gas outlets are respectively provided at two opposite sides of the middle gas outlet in a width direction of the middle gas outlet, the gas inlet end comprises a first pipe interface and a second pipe interface, the first pipe interface is in communication with the middle gas outlet, and the second pipe interface is in communication with the plurality of outer gas outlets;
• and
• a gas diffusion assembly comprising a guider;
• wherein a first end of the guider in a length direction of the guider is configured for connecting with the gas outlet end, and a second end of the guider in the length direction of the guider is configured for connecting with the reaction chamber;
• the guider comprises a middle flow channel corresponding to the middle gas outlet and a plurality of outer flow channels corresponding to the plurality of outer gas outlets, and two of the plurality of outer flow channels are respectively provided at two opposite sides of the middle flow channel in a width direction of the middle flow channel;
• and the plurality of outer flow channels and the middle flow channel extend in parallel along the length direction of the guider, and a width ratio of each outer flow channel to the middle flow channel is 40±10:20±20.