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US 8,945,306 B2Granted
Gas supply device
AssigneeTokyo Electron Limited
InventorEinosuke Tsuda
Life of this patent
Estimating the term…
Abstract
A gas supply device disposed opposite to a substrate mounted on a loading board in a processing container and supplying a process gas for processing the substrate comprises a top plate member having a recess formed to spread gradually toward the state in order to constitute a gas diffusion space at a position facing the substrate on the loading board, and a gas supply nozzle projecting into the recess from the top thereof and having a plurality of gas supply holes along the circumferential direction of the recess.
Claims9
A gas supply device for supplying a process gas to a substrate comprising:
- a loading board provided in a processing chamber configured to receive the substrate;
- a top plate member provided with a concave portion having a shape that end portion thereof is widening toward the loading board to form a gas diffusion space at a position that faces the substrate on the loading board;
- and
- a gas supply nozzle projected from a peak position to inside of the concave portion, and having a plurality of gas supply holes along a circumferential direction of the gas supply nozzle,
- wherein the gas supply nozzle is configured in such a way that the number of openings in the plurality of gas supply holes per unit area of the gas supply nozzle increases along the direction from a front-end side to a rear-end side.
2 more elements
Dependencies are inferred from the claim text.