C23C 14/3485
Using pulsed power to the target
Official title: {using pulsed power to the target}
C23C14/3485 (Using pulsed power to the target) appears on 270 US grants and 418 published applications in this corpus.
Search patents in C23C- Granted patents
- 270
- Published applications
- 418
- Assignees
- 206
- Inventors
- 868
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 2 |
| 2006 | 0 | 2 |
| 2007 | 0 | 3 |
| 2008 | 0 | 2 |
| 2009 | 0 | 5 |
| 2010 | 2 | 7 |
| 2011 | 1 | 12 |
| 2012 | 5 | 14 |
| 2013 | 4 | 13 |
| 2014 | 6 | 19 |
| 2015 | 13 | 32 |
| 2016 | 13 | 31 |
| 2017 | 26 | 30 |
| 2018 | 20 | 32 |
| 2019 | 22 | 29 |
| 2020 | 24 | 28 |
| 2021 | 28 | 34 |
| 2022 | 23 | 25 |
| 2023 | 17 | 34 |
| 2024 | 27 | 22 |
| 2025 | 25 | 27 |
| 2026 | 12 | 14 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Coated cutting tool with an alternating layer composition6 Oct 2026US 12,752,344 B2Walter AG
- Nitride laminate and manufacturing method of the same18 Aug 2026US 12,713,843 B2Nitto Denko Corporation
- Al-rich AlTiN-based films7 Jul 2026US 12,674,231 B2Oerlikon Surface Solutions AG, PfäFfikon
- Method for producing transparent conductive coatings for emi protection using HiPIMS26 May 2026US 12,637,753 B2Raytheon Company
- Oxide film preparation method26 May 2026US 12,637,754 B2Beijing Naura Microelectronics Equipment Co., Ltd.
- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
- Thermally stable metallic glass films via steep compositional gradients8 Oct 2026US 2026/0308748 A1
- Max-ag electrically conductive composite coating and preparation method thereof6 Aug 2026US 2026/0226606 A1Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences
- Method for manufacturing a nuclear fuel rod cladding and corresponding nuclear fuel rod cladding6 Aug 2026US 2026/0229379 A1
- High power generator, pulsing arrangement, and method of supplying a plasma process with high power pulses2 Jul 2026US 2026/0188616 A1Trumpf Huettinger Sp. Z O. O.
Most cited
By later US patents
- Charge removal from electrodes in unipolar sputtering system79US 9,620,340 B2Advanced Energy Industries, Inc. · 2017
- Rate enhanced pulsed DC sputtering system79US 9,812,305 B2Advanced Energy Industries, Inc. · 2017
- Charge removal from electrodes in unipolar sputtering system75US 9,287,098 B2Advanced Energy Industries, Inc. · 2016
- Systems and methods for single magnetron sputtering72US 10,373,811 B2AES Global Holdings PTE Ltd. · 2019
- Method of controlling ion energy distribution using a pulse generator with a current-return output stage70US 10,555,412 B2APPLIED Materials.Inc. · 2020