C11D 7/105
Nitrates
Official title: {Nitrates; Nitrites}
C11D7/105 (Nitrates) appears on 36 US grants and 40 published applications in this corpus.
Search patents in C11D- Granted patents
- 36
- Published applications
- 40
- Assignees
- 32
- Inventors
- 91
- Latest grant
- 10 Jun 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 1 |
| 2002 | 1 | 0 |
| 2003 | 1 | 2 |
| 2004 | 0 | 0 |
| 2005 | 1 | 1 |
| 2006 | 1 | 2 |
| 2007 | 3 | 0 |
| 2008 | 0 | 1 |
| 2009 | 1 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 3 |
| 2013 | 2 | 3 |
| 2014 | 0 | 1 |
| 2015 | 2 | 5 |
| 2016 | 2 | 1 |
| 2017 | 2 | 6 |
| 2018 | 4 | 2 |
| 2019 | 3 | 1 |
| 2020 | 1 | 2 |
| 2021 | 1 | 2 |
| 2022 | 2 | 2 |
| 2023 | 1 | 1 |
| 2024 | 1 | 1 |
| 2025 | 2 | 1 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photoresist remover10 Jun 2025US 12,325,844 B2Versum Materials US, LLC
- Treatment liquid and method for treating object to be treated7 Jan 2025US 12,187,984 B2FUJIFILM Corporation
- Treatment liquid and method for treating object to be treated12 Nov 2024US 12,139,693 B2FUJIFILM Corporation
- Method for nickel-free phosphating metal surfaces9 May 2023US 11,643,731 B2Chemetall GmbH
- Composition having suppressed alumina damage and production method for semiconductor substrate using same25 Oct 2022US 11,479,744 B2Mitsubishi Gas Chemical Company, Inc.
- Surface Coatings for Enhanced Substrate Properties30 Jul 2026US 2026/0217554 A1Temple University of the Commonwealth System of Higher Education
- Compositions For Removing A Photoresist From A Substrate And Uses Thereof16 Oct 2025US 2025/0321491 A1Versum Materials US, LLC
- Cleaning composition and method of cleaning mask by using the same29 Aug 2024US 2024/0288785 A1Dongwoo Fine-Chem Co., Ltd.
- Treatment liquid and method for treating object to be treated25 May 2023US 2023/0159864 A1FUJIFILM Corporation
- Photoresist Remover20 Oct 2022US 2022/0333044 A1Versum Materials US, LLC
Most cited
By later US patents
- Process for removing residues from a semiconductor substrate57US 6,033,993 AOlin Microelectronic Chemicals, Inc. · 2000
- Composition for selective etching of oxides over metals31US 6,361,712 B1Arch Specialty Chemicals, Inc. · 2002
- Composition for selective etching of oxides over metals18US 6,589,439 B2Arch Specialty Chemicals, Inc. · 2003
- Cooling system cleaning solutions14US 5,062,987 ABASF SE · 1991
- Drain cleaning composition11US 4,058,474 AThe Drackett Company · 1977