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US 6,589,439 B2Granted
Composition for selective etching of oxides over metals
AssigneeArch Specialty Chemicals, Inc.
InventorsKenji Honda, Michelle Elderkin
Life of this patent
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Abstract
A composition for selective etching of oxides over a metal. The composition contains water, hydroxylammonium salt, carboxylic acid, a fluorine containing compound, and optionally, a base. The pH of the composition is about 2 to 6.
Claims6
A method for removing the residue on a metal substrate having low-k interlayers, after plasma etching and/or chemical mechanical polishing, comprising the step of:
- applying a composition comprising (a) water, (b) hydroxylammonium salt, (c) carboxylic acid, and (d) a fluorine containing compound to the metal substrate.
Dependencies are inferred from the claim text.