C11D 7/02
Inorganic compounds
C11D7/02 (Inorganic compounds) appears on 1,558 US grants and 1,679 published applications in this corpus.
Search patents in C11D- Granted patents
- 1,558
- Published applications
- 1,679
- Assignees
- 762
- Inventors
- 3,613
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 13 | 0 |
| 1977 | 10 | 0 |
| 1978 | 11 | 0 |
| 1979 | 5 | 0 |
| 1980 | 14 | 0 |
| 1981 | 4 | 0 |
| 1982 | 5 | 0 |
| 1983 | 4 | 0 |
| 1984 | 12 | 0 |
| 1985 | 9 | 0 |
| 1986 | 9 | 0 |
| 1987 | 10 | 0 |
| 1988 | 14 | 0 |
| 1989 | 13 | 0 |
| 1990 | 12 | 0 |
| 1991 | 10 | 0 |
| 1992 | 9 | 0 |
| 1993 | 22 | 0 |
| 1994 | 17 | 0 |
| 1995 | 28 | 0 |
| 1996 | 28 | 0 |
| 1997 | 16 | 0 |
| 1998 | 42 | 0 |
| 1999 | 35 | 0 |
| 2000 | 43 | 0 |
| 2001 | 37 | 17 |
| 2002 | 57 | 62 |
| 2003 | 52 | 71 |
| 2004 | 35 | 78 |
| 2005 | 32 | 75 |
| 2006 | 44 | 86 |
| 2007 | 35 | 56 |
| 2008 | 40 | 72 |
| 2009 | 35 | 72 |
| 2010 | 34 | 59 |
| 2011 | 49 | 53 |
| 2012 | 38 | 66 |
| 2013 | 39 | 77 |
| 2014 | 58 | 67 |
| 2015 | 46 | 93 |
| 2016 | 57 | 73 |
| 2017 | 56 | 85 |
| 2018 | 47 | 77 |
| 2019 | 59 | 68 |
| 2020 | 51 | 57 |
| 2021 | 60 | 59 |
| 2022 | 52 | 63 |
| 2023 | 33 | 60 |
| 2024 | 51 | 55 |
| 2025 | 40 | 47 |
| 2026 | 26 | 31 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- System and method for impurity removal from cargo tanks of vessels that store and transport hydrocarbons6 Oct 2026US 12,753,373 B2Chevron U.S.A.Inc.
- Ambient moisture-activated hard surface treatment powder comprising a carbonate/persalt/sulfonium or phosphonium salt combination29 Sep 2026US 12,747,417 B2Sterilex, LLC
- Solid controlled release caustic detergent compositions22 Sep 2026US 12,742,136 B2Ecolab USA Inc.
- Cleaning liquid and method for cleaning semiconductor substrate8 Sep 2026US 12,733,424 B2FUJIFILM Corporation
- Polyester film recovery method, recycled polyester product, recovery device, and functional layer removal agent25 Aug 2026US 12,715,976 B2Mitsubishi Chemical Corporation
- Processing solution, method for processing semiconductor substrate, and method for manufacturing semiconductor device1 Oct 2026US 2026/0297465 A1Tokyo Ohka Kogyo.Co., Ltd.
- Cleaning compositions with n-substituted piperazines24 Sep 2026US 2026/0286257 A1Dow Global Technologies LLC
- Clean toilet and accessories10 Sep 2026US 2026/0266036 A1Kohler Co.
- Solvent-based compositions for post-etch residue removal and related methods27 Aug 2026US 2026/0250607 A1Entegris, Inc.
- Enzymatic cleaner for an automated clinical analyzer and methods of use thereof13 Aug 2026US 2026/0234511 A1Siemens Healthcare Diagnostics Inc.
Most cited
By later US patents
- Electrochemical production of ozone and hydrogen peroxide465US 5,972,196 ALynntech, Inc. · 1999
- Thickened acidic aqueous compositions using cross-linked dialkylaminoacrylic microparticles202US 5,100,660 AAllied Colloids Limited · 1992
- Semiconductor wafer cleaning system181US 5,656,097 AVerteq, Inc. · 1997
- Surface treating cleaning method174US 5,290,361 APurex Corporation · 1994
- Compact cleaner containing surfactants167US 6,331,518 B2Henkel-Ecolab GmbH & Co. OHG · 2001