C09K 13/02
Containing an alkali metal hydroxide
Official title: containing an alkali metal hydroxide
C09K13/02 (Containing an alkali metal hydroxide) appears on 109 US grants and 145 published applications in this corpus.
Search patents in C09K- Granted patents
- 109
- Published applications
- 145
- Assignees
- 102
- Inventors
- 378
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 2 |
| 2003 | 0 | 0 |
| 2004 | 3 | 3 |
| 2005 | 1 | 1 |
| 2006 | 0 | 4 |
| 2007 | 1 | 4 |
| 2008 | 1 | 2 |
| 2009 | 1 | 3 |
| 2010 | 3 | 9 |
| 2011 | 1 | 5 |
| 2012 | 1 | 7 |
| 2013 | 4 | 7 |
| 2014 | 5 | 11 |
| 2015 | 3 | 12 |
| 2016 | 10 | 5 |
| 2017 | 3 | 5 |
| 2018 | 8 | 4 |
| 2019 | 7 | 8 |
| 2020 | 6 | 12 |
| 2021 | 8 | 5 |
| 2022 | 4 | 9 |
| 2023 | 8 | 8 |
| 2024 | 7 | 8 |
| 2025 | 7 | 6 |
| 2026 | 4 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Etchant composition, a pattern formation method and a manufacturing method of array substrate using the etchant composition11 Aug 2026US 12,703,826 B2Dongwoo Fine-Chem Co., Ltd.
- Wet anisotropic etching of silicon23 Jun 2026US 12,662,627 B2Texas Instruments Incorporated
- Substrate processing method and substrate processing device2 Jun 2026US 12,648,383 B2SCREEN Holdings Co., Ltd.
- Substrate processing method and substrate processing apparatus10 Feb 2026US 12,545,839 B2SCREEN Holdings Co., Ltd.
- Composition for surface treatment and surface treatment method using the same30 Dec 2025US 12,509,633 B2Foosung Co., Ltd.
- Silicon etchant composition and method of forming pattern using the same2 Jul 2026US 2026/0184990 A1Dongwoo Fine-Chem Co., Ltd.
- Method of manufacturing cover window for display device, and electronic device11 Jun 2026US 2026/0159441 A1Samsung Display Co., Ltd.
- Backside polishing additive for reducing alkali consumption and preparation method and use thereof28 May 2026US 2026/0145165 A1
- Etching liquid, etching method, and method for manufacturing semiconductor device30 Apr 2026US 2026/0117124 A1Mitsubishi Chemical Corporation
- Etching composition, method for manufacturing etching composition, etching method, method for manufacturing semiconductor device, and method for manufacturing gate-all-around transistor8 Jan 2026US 2026/0008957 A1Mitsubishi Chemical Corporation
Most cited
By later US patents
- Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors39US 7,671,001 B2Mallinckrodt Baker, Inc. · 2010
- Process for rendering kapton or other polyimide film photo sensitive to catalyst for the deposition of various metals in pattern thereon35US 4,112,139 AAMP Incorporated · 1978
- Method of making sensitized polyimide polymers, having catalyst and electroless metal, metal deposits thereon and circuit patterns of various metallization schemes31US 4,078,096 AAMP Incorporated · 1978
- Semiconductor etching paste and the use thereof for localized etching of semiconductor substrates24US 7,196,018 B2Interuniversitair Microelektronica Centrum vzw · 2007
- Sodium permanganate etch baths containing a co-ion for permanganate and their use in desmearing and/or etching printed circuit boards20US 4,601,784 AMorton Thiokol, Inc. · 1986