Wet anisotropic etching of silicon
AssigneeTexas Instruments Incorporated
InventorSimon Joshua Jacobs
Life of this patent
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Abstract
An alkaline etching solution comprising a hydroxide salt (e.g., an alkali metal hydroxide, an ammonium hydroxide, or a combination thereof), a polyol having at least three hydroxyl (—OH) groups, and water. Also provided is a method of producing a semiconductor device by obtaining a semiconductor substrate having masked and unmasked surfaces; exposing the semiconductor substrate having the masked and unmasked surfaces to an alkaline etching solution, such that the unmasked surfaces of the substrate are anisotropically etched, wherein the alkaline etching solution comprises: a hydroxide salt; a polyol having at least three hydroxyl (—OH) groups; and water; and performing additional processing to produce the semiconductor device.
Claims19
An alkaline etching solution comprising:
- a hydroxide salt;
- a polyol;
- and
- water,
- wherein the polyol has the formula:
- R—(CH(OH))m—R′—(CH(OH))n—R″, wherein m and n are each greater than or equal to 1 and/or m+n is greater than 3, and wherein R, R′, and R″ each independently comprise hydrogen, a functionalized or non-functionalized alkyl, aryl, alkoxy, sulfoxide, or sulfone group.
A solution comprising:
- a hydroxide salt;
- a polyol;
- and
- water,
- wherein the polyol has the formula:
- R—(CH(OH))m—R′—(CH(OH))n—R″, wherein m and n are each greater than or equal to 1 and/or m+n is greater than 3, and wherein R, R′, and R″ each independently comprise hydrogen, a functionalized or non-functionalized alkyl, aryl, alkoxy, sulfoxide, or sulfone group.
An alkaline etching solution comprising:
- a hydroxide salt comprising potassium hydroxide or tetramethylammonium hydroxide;
- a polyol;
- and
- water, wherein the alkaline etching solution is at least 35 percent polyol,
- wherein the polyol has the formula:
- R—(CH(OH))m—R′—(CH(OH))n—R″, wherein m and n are each greater than or equal to 1 and/or m+n is greater than 3, and wherein R, R′, and R″ each independently comprise hydrogen, a functionalized or non-functionalized alkyl, aryl, alkoxy, sulfoxide, or sulfone group.
Dependencies are inferred from the claim text.