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US 12,703,826 B2Granted
Etchant composition, a pattern formation method and a manufacturing method of array substrate using the etchant composition
AssigneesDongwoo Fine-Chem Co., Ltd., Samsung Electronics Co., Ltd.
InventorsJin-Kyu Roh, Ji-Won Kim, Kyu-Sang Ahn, Hee-Suk Woo, Jung-Min Oh, Sang-Won Bae, Hyo-San Lee
Life of this patent
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Abstract
An etchant composition contains (A) an alkaline compound, (B) an organoaluminum, and (C) water. The composition may be used in a method of forming a pattern. The composition also may be used in a method of fabricating an array substrate.
Claims13
An etchant composition containing:
- (A) an alkaline compound;
- (B) an organoaluminum;
- and (C) water, wherein the organoaluminum (B) comprises a compound represented by the following Formula 1:
- wherein R1 to R3 are each independently an alkyl group having 1 to 5 carbon atoms or an aryl group having 6 to 30 carbon atoms, wherein the alkyl group having 1 to 5 carbon atoms is unsubstituted or substituted with one or more of an amine group, an aniline group, a quinol group, hydrogen, silicon, and halogens.
1 more element
An etchant composition containing:
- (A) an alkaline compound;
- (B) methylaluminoxane;
- and (C) water.
Dependencies are inferred from the claim text.