Backside polishing additive for reducing alkali consumption and preparation method and use thereof

Abstract

The present disclosure discloses a backside polishing additive for reducing alkali consumption, and a preparation method and a use thereof. The backside polishing additive includes components in percentages by mass as follows: 0.01% to 0.5% of a catalyst containing a nitrobenzene structure, 0.1% to 1% of a defoaming agent, 0.5% to 1.5% of a preservative, and the balance of water. The additive of the present disclosure enables a polishing reaction at a required alkali concentration or consumption lower than the conventional additive. Therefore, the present additive has more significant alkali-reducing capability than the conventional additive. Additionally, the silicon wafer obtained through the use of the additive of the present disclosure to conduct the alkali polishing reaction has a surface with a good flatness of the tower base and a high reflectivity, indicating a superior polishing effect, and resulting in a significant enhancement of the cell efficiency.

Dependencies are inferred from the claim text.