Composition for surface treatment and surface treatment method using the same

A composition for surface treatment of a substrate, the composition comprising:

• from about 30-50 wt. % fluorosilicic acid (H2SiF6);
• inorganic acid other than hydrofluoric acid;
• and
• hydrofluoric acid (HF), wherein a value calculated by Equation 1 below is 0.80 or more:
• Sihydro/Sitotal [Equation 1]
• where in Equation 1, Sitotal is a total content (ppm) of silicon (Si) in the composition, and
• Sihydro is a content (ppm) of the silicon (Si) derived from the fluorosilicic acid;
• wherein a content of the inorganic acid in the composition is 1 wt % or less with respect to the total composition.