C07C 309/12
Containing esterified hydroxy groups bound to the carbon skeleton
Official title: containing esterified hydroxy groups bound to the carbon skeleton
C07C309/12 (Containing esterified hydroxy groups bound to the carbon skeleton) appears on 186 US grants and 263 published applications in this corpus.
Search patents in C07C- Granted patents
- 186
- Published applications
- 263
- Assignees
- 40
- Inventors
- 379
- Latest grant
- 12 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 1 |
| 2007 | 0 | 2 |
| 2008 | 0 | 5 |
| 2009 | 6 | 7 |
| 2010 | 1 | 20 |
| 2011 | 7 | 18 |
| 2012 | 11 | 19 |
| 2013 | 14 | 16 |
| 2014 | 18 | 12 |
| 2015 | 23 | 5 |
| 2016 | 14 | 13 |
| 2017 | 13 | 9 |
| 2018 | 6 | 17 |
| 2019 | 5 | 12 |
| 2020 | 12 | 8 |
| 2021 | 7 | 12 |
| 2022 | 7 | 18 |
| 2023 | 11 | 22 |
| 2024 | 10 | 17 |
| 2025 | 7 | 18 |
| 2026 | 6 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Salt, acid generator, resist composition and method for producing resist pattern12 May 2026US 12,624,016 B2Sumitomo Chemical Company, Limited
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device5 May 2026US 12,619,147 B2FUJIFILM Corporation
- Multifunctional linker compounds10 Mar 2026US 12,570,600 B220Bloc, Inc.
- Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound17 Feb 2026US 12,554,196 B2FUJIFILM Corporation
- Salt, acid generator, resist composition and method for producing resist pattern10 Feb 2026US 12,547,073 B2Sumitomo Chemical Company, Limited
- Resist composition, resist pattern formation method, compound, and polymer compound8 Oct 2026US 2026/0310077 A1Tokyo Ohka Kogyo.Co., Ltd.
- Preparation of polymer, preparation of chemically amplified resist composition, resist pattern forming process, polymer, and chemically amplified resist composition3 Sep 2026US 2026/0259497 A1Shin-Etsu Chemical Co., Ltd.
- Onium salt, chemically amplified resist composition, and pattern forming process6 Aug 2026US 2026/0226003 A1Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt, chemically amplified resist composition, and pattern forming process30 Jul 2026US 2026/0219569 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition and method for producing resist pattern, and salt and resin23 Jul 2026US 2026/0211321 A1Sumitomo Chemical Company, Limited
Most cited
By later US patents
- Sulfonate compound process for producing the same, and bleach composition comprising the same68US 5,637,755 AKao Corporation · 1997
- Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process59US 8,105,748 B2Shin-Etsu Chemical Co., Ltd. · 2012
- Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process34US 7,511,169 B2Shin-Etsu Chemical Co., Ltd. · 2009
- Photoacid generators, resist compositions, and patterning process31US 7,527,912 B2Shin-Etsu Chemical Co., Ltd. · 2009
- Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process31US 8,057,985 B2Shin-Etsu Chemical Co., Ltd. · 2011