Resist composition and method for producing resist pattern, and salt and resin
AssigneeSumitomo Chemical Company, Limited
InventorsShohei TERAHIGASHI, Wataru NOJO, Koji ICHIKAWA
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AssigneeSumitomo Chemical Company, Limited
InventorsShohei TERAHIGASHI, Wataru NOJO, Koji ICHIKAWA
Estimating the term…
A resist composition includes a salt represented by formula (I) or a resin that includes a structural unit represented by formula (IP): wherein Q1, Q2, R11 and R12 each represent a H atom or the like; X1 represents a single bond or the like; W1 represents a single bond or a substituted/unsubstituted cyclic hydrocarbon group; L1, A1, L10 and L20 each represent a single bond or a substituted/unsubstituted hydrocarbon group; W2 represents a cyclic hydrocarbon group having an I atom; R2 represents a substituted/unsubstituted hydrocarbon group; z represents an integer of 0 to 6, mm2 represents an integer of 1 to 5, m3 represents an integer of 0 to 4, mm1 represents 0 or 1, m2 represents 1 or 2; R3 represents a halogen atom or a substituted/unsubstituted hydrocarbon group; R20 represents a H atom or the like; and X20 represents a single bond, —O— or the like.
A resist composition comprising a salt represented by formula (I) or a resin that includes a structural unit represented by formula (IP):
A salt represented by formula (I):
A resin comprising a structural unit represented by formula (IP):
Dependencies are inferred from the claim text.