Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasaki Ohashi, Takeshi Kinsho, Youichi Ohsawa, Jun Hatakeyama, Seiichiro Tachibana
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Abstract
A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C20 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.
Claims11
A sulfonium salt having the general formula (1):
- wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2, R3 and R4 are each independently a substituted or unsubstituted, straight or branched C1-C10 alkyl, alkenyl or oxoalkyl group or a substituted or unsubstituted C6-C18 aryl, aralkyl or aryloxoalkyl group, or at least two of R2, R3 and R4 may bond together to form a ring with the sulfur atom to which they are attached, A is a divalent C1-C20 organic group which may contain a heteroatom, and n is 0 or 1.
A polymer capable of generating a sulfonic acid in response to high-energy radiation or heat, the sulfonic acid comprising recurring units of the general formula (1a):
- wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, A is a divalent C1-C20 organic group which may contain a heteroatom, and n is 0 or 1.
A polymer comprising recurring units of the general formula (1b):
- wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2, R3 and R4 are each independently a substituted or unsubstituted, straight or branched C1-C10 alkyl, alkenyl or oxoalkyl group or a substituted or unsubstituted C6-C18 aryl, aralkyl or aryloxoalkyl group, or at least two of R2, R3 and R4 may bond together to form a ring with the sulfur atom to which they are attached, A is a divalent C1-C20 organic group which may contain a heteroatom, and n is 0 or 1.
Dependencies are inferred from the claim text.