Y10S 438/967
Semiconductor on specified insulator
Y10S438/967 (Semiconductor on specified insulator) appears on 154 US grants and 54 published applications in this corpus.
Search patents in Y10S- Granted patents
- 154
- Published applications
- 54
- Assignees
- 71
- Inventors
- 220
- Latest grant
- 22 Sep 2020
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 4 | 0 |
| 1979 | 8 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 5 | 0 |
| 1988 | 2 | 0 |
| 1989 | 5 | 0 |
| 1990 | 3 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 4 | 0 |
| 1994 | 4 | 0 |
| 1995 | 5 | 0 |
| 1996 | 9 | 0 |
| 1997 | 11 | 0 |
| 1998 | 8 | 0 |
| 1999 | 10 | 0 |
| 2000 | 6 | 0 |
| 2001 | 4 | 2 |
| 2002 | 8 | 9 |
| 2003 | 4 | 7 |
| 2004 | 4 | 5 |
| 2005 | 5 | 11 |
| 2006 | 4 | 4 |
| 2007 | 8 | 4 |
| 2008 | 2 | 4 |
| 2009 | 6 | 3 |
| 2010 | 7 | 1 |
| 2011 | 2 | 1 |
| 2012 | 1 | 2 |
| 2013 | 0 | 1 |
| 2014 | 1 | 0 |
| 2015 | 2 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Ionizing radiation blocking in IC chip to reduce soft errors22 Sep 2020US 10,784,200 B2International Business Machines Corporation
- Ionizing radiation blocking in IC chip to reduce soft errors7 Apr 2015US 8,999,764 B2International Business Machines Corporation
- Vertical group III-V nanowires on si, heterostructures, flexible arrays and fabrication13 Jan 2015US 8,932,940 B2The Regents of the University of California
- Method for forming SOI substrate and apparatus for forming the same12 Aug 2014US 8,802,534 B2Semiconductor Energy Laboratory Co.Ltd.
- Process for manufacturing a wafer by annealing of buried channels18 Dec 2012US 8,334,188 B2STMicroelectronics S,r.l.
- Process for manufacturing a wafer by annealing of buried channels8 Aug 2013US 2013/0200484 A1STMicroelectronics S,r.l.
- Method for forming soi substrate and apparatus for forming the same20 Dec 2012US 2012/0322228 A1Semiconductor Energy Laboratory Co.Ltd.
- Ionizing radiation blocking in ic chip to reduce soft errors28 Jun 2012US 2012/0161300 A1International Business Machines Corporation
- Vertical group iii-v nanowires on si, heterostructures, flexible arrays and fabrication20 Oct 2011US 2011/0253982 A1The Regents of the University of California
- Process for manufacturing a wafer by annealing of buried channels23 Sep 2010US 2010/0237459 A1STMicroelectronics S,r.l.
Most cited
By later US patents
- Membrane dielectric isolation IC fabrication247US 5,354,695 A1994
- Membrane dielectric isolation IC fabrication223US 5,571,741 A1996
- Membrane dielectric isolation IC fabrication191US 5,840,593 AElm Technology Corporation · 1998
- Membrane dielectric isolation transistor fabrication184US 5,592,007 A1997
- Membrane dielectric isolation IC fabrication177US 5,592,018 A1997