Y10S 438/909
Controlled atmosphere
Y10S438/909 (Controlled atmosphere) appears on 263 US grants and 74 published applications in this corpus.
Search patents in Y10S- Granted patents
- 263
- Published applications
- 74
- Assignees
- 115
- Inventors
- 538
- Latest grant
- 1 Apr 2014
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 4 | 0 |
| 1981 | 3 | 0 |
| 1982 | 5 | 0 |
| 1983 | 3 | 0 |
| 1984 | 4 | 0 |
| 1985 | 3 | 0 |
| 1986 | 5 | 0 |
| 1987 | 5 | 0 |
| 1988 | 2 | 0 |
| 1989 | 9 | 0 |
| 1990 | 4 | 0 |
| 1991 | 5 | 0 |
| 1992 | 6 | 0 |
| 1993 | 7 | 0 |
| 1994 | 16 | 0 |
| 1995 | 14 | 0 |
| 1996 | 10 | 0 |
| 1997 | 13 | 0 |
| 1998 | 15 | 0 |
| 1999 | 16 | 0 |
| 2000 | 14 | 0 |
| 2001 | 14 | 7 |
| 2002 | 11 | 8 |
| 2003 | 13 | 10 |
| 2004 | 6 | 12 |
| 2005 | 13 | 9 |
| 2006 | 10 | 5 |
| 2007 | 5 | 6 |
| 2008 | 3 | 8 |
| 2009 | 6 | 4 |
| 2010 | 2 | 3 |
| 2011 | 5 | 2 |
| 2012 | 4 | 0 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- E-chuck with automated clamped force adjustment and calibration1 Apr 2014US 8,685,759 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Methods of processing a substrate and forming a micromagnetic device16 Oct 2012US 8,288,277 B2Enpirion, Inc.
- Capacitive element fabrication method10 Jul 2012US 8,216,950 B2Eudyna Devices Inc.
- Addition of ballast hydrocarbon gas to doped polysilicon etch masked by resist12 Jun 2012US 8,198,103 B2International Business Machines Corporation
- Method of manufacturing a semiconductor integrated circuit device including elimination of static charge of a treated wafer21 Feb 2012US 8,119,547 B2Renesas Electronics Corporation
- Methods of Processing a Substrate and Forming a Micromagnetic Device8 Sep 2011US 2011/0217793 A1Enpirion, Inc.
- E-chuck with automated clamped force adjustment and calibration24 Feb 2011US 2011/0042006 A1Taiwan Semiconductor Manufacturing Company.Ltd
- E-chuck for automated clamped force adjustment and calibration30 Sep 2010US 2010/0248398 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Systems and Methods for Synthesis of Extended Length Nanostructures22 Apr 2010US 2010/0099319 A1Nanocomp Technologies, Inc.
- Semiconductor device and fabrication method therefor, capacitive element and fabrication method therefor, and mis type semiconductor device and fabrication method therefor1 Apr 2010US 2010/0081241 A1Eudyna Devices Inc.
Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Atomic layer epitaxy (ALE) apparatus for growing thin films of elemental semiconductors721US 5,281,274 AThe United States of America as represented by the Secretary of the Navy · 1994
- Apparatus for and a method of growing thin films of elemental semiconductors671US 5,225,366 AThe United States of America as represented by the Secretary of the Navy · 1993
- Apparatus and method for low pressure chemical vapor deposition using multiple chambers and vacuum pumps552US 5,873,942 ASamsung Electronics Co., Ltd. · 1999
- Apparatus and method for enhanced degassing of semiconductor wafers for increased throughput434US 6,497,734 B1Novellus Systems, Inc. · 2002