Y10S 148/10
Lift-off masking
Y10S148/10 (Lift-off masking) appears on 96 US grants and 4 published applications in this corpus.
Search patents in Y10S- Granted patents
- 96
- Published applications
- 4
- Assignees
- 52
- Inventors
- 188
- Latest grant
- 13 Mar 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 2 | 0 |
| 1980 | 2 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 3 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 3 | 0 |
| 1989 | 5 | 0 |
| 1990 | 5 | 0 |
| 1991 | 9 | 0 |
| 1992 | 11 | 0 |
| 1993 | 13 | 0 |
| 1994 | 4 | 0 |
| 1995 | 4 | 0 |
| 1996 | 9 | 0 |
| 1997 | 5 | 0 |
| 1998 | 4 | 0 |
| 1999 | 6 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 1 |
| 2018 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- System and method for producing a nano metal mesh using a brittle film template for lithography13 Mar 2018US 9,915,002 B2
- Method of manufacturing a semiconductor device and a process of manufacturing a thin film transistor25 Jul 2000US 6,093,586 ASony Corporation
- Self-aligned base ohmic metal for an HBT device cross-reference to related applications30 Nov 1999US 5,994,194 ATRW Inc.
- Processing techniques for achieving production-worthy, low dielectric, low interconnect resistance and high performance ICS12 Oct 1999US 5,965,934 AAdvanced Micro Devices, Inc.
- Transistor fabrication employing formation of silicide across source and drain regions prior to formation of the gate conductor29 Jun 1999US 5,918,130 AAdvanced Micro Devices, Inc.
- System and Method for Producing a Nano Metal Mesh using a Brittle Film Template for Lithography21 Jun 2018US 2018/0173345 A1
- System and Method for Producing a Nano Metal Mesh using a Brittle Film Template for Lithography23 Mar 2017US 2017/0081769 A1
- Method of manufacturing a semiconductor device and a process of a thin film transistor21 Apr 2005US 2005/0085099 A1Sony Corporation
- Method of manufacturing a semiconductor device and a process of a thin film transistor6 Nov 2003US 2003/0207507 A1
Most cited
By later US patents
- Method of forming trench buried wiring for semiconductor device505US 5,266,526 AKabushiki Kaisha Toshiba · 1993
- Processing techniques for achieving production-worthy, low dielectric, low dielectric, low interconnect resistance and high performance IC113US 5,679,608 AAdvanced Micro Devices, Inc. · 1997
- Method for forming patterned films on a substrate109US 5,240,878 AInternational Business Machines Corporation · 1993
- Processing techniques for achieving production-worthy, low dielectric, low interconnect resistance and high performance ICS103US 5,550,405 AAdvanced Micro Devices, Inc. · 1996
- Fabrication of self-aligned, T-gate HEMT90US 5,053,348 AHughes Aircraft Company · 1991