H05H 1/0037
By spectrometry
Official title: {by spectrometry}
H05H1/0037 (By spectrometry) appears on 66 US grants and 77 published applications in this corpus.
Search patents in H05H- Granted patents
- 66
- Published applications
- 77
- Assignees
- 63
- Inventors
- 214
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 3 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 2 |
| 2003 | 0 | 3 |
| 2004 | 2 | 3 |
| 2005 | 1 | 0 |
| 2006 | 4 | 1 |
| 2007 | 1 | 0 |
| 2008 | 1 | 2 |
| 2009 | 0 | 3 |
| 2010 | 4 | 0 |
| 2011 | 1 | 1 |
| 2012 | 0 | 0 |
| 2013 | 1 | 1 |
| 2014 | 2 | 3 |
| 2015 | 1 | 3 |
| 2016 | 1 | 3 |
| 2017 | 2 | 3 |
| 2018 | 2 | 3 |
| 2019 | 4 | 6 |
| 2020 | 5 | 9 |
| 2021 | 5 | 8 |
| 2022 | 5 | 5 |
| 2023 | 3 | 4 |
| 2024 | 7 | 6 |
| 2025 | 6 | 5 |
| 2026 | 2 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma control for spark optical emission spectroscopy5 May 2026US 12,621,920 B2FEI Company
- Plasma torch device component monitoring21 Apr 2026US 12,610,448 B2Edwards Limited
- Multiple plasma ion source for inline secondary ion mass spectrometry21 Oct 2025US 12,452,988 B2APPLIED Materials.Inc.
- Feedback detection for a treatment device12 Aug 2025US 12,383,143 B2Avava, Inc.
- Glow plasma stabilization15 Jul 2025US 12,362,140 B2Servomex Group Limited
- Apparatus for Controlling a Composition of a Plasma20 Aug 2026US 2026/0247517 A1The University of Liverpool
- Radical Sensing for Process Tool Diagnostics30 Jul 2026US 2026/0221402 A1MKS Instruments, Inc.
- Multiple Plasma Ion Source for Inline Secondary Ion Mass Spectrometry22 Jan 2026US 2026/0025902 A1APPLIED Materials.Inc.
- Feedback detection for a treatment device20 Nov 2025US 2025/0352065 A1Avava, Inc.
- Plasma source chamber for a spectrometer19 Jun 2025US 2025/0198934 A1Thermo Fisher Scientific (Bremen) GmbH
Most cited
By later US patents
- Method and system for analyzing plasma data37US 5,546,322 AInternational Business Machines Corporation · 1996
- Plasma monitoring method and plasma monitor21US 4,541,718 AHitachi, Ltd. · 1985
- Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method16US 6,703,613 B2Hitachi High-Technologies Corporation · 2004
- Plasma mass spectrometry15US 5,519,215 A1996
- Microwave plasma equipment and method of exciting plasma11US 10,750,606 B1Institute of Microelectronics, Chinese Academy of Sciences · 2020