H01J 37/3467
Pulsed operation
Official title: {Pulsed operation, e.g. HIPIMS}
H01J37/3467 (Pulsed operation) appears on 178 US grants and 276 published applications in this corpus.
Search patents in H01J- Granted patents
- 178
- Published applications
- 276
- Assignees
- 110
- Inventors
- 443
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 1 | 2 |
| 2006 | 0 | 0 |
| 2007 | 0 | 2 |
| 2008 | 0 | 4 |
| 2009 | 0 | 9 |
| 2010 | 2 | 9 |
| 2011 | 0 | 10 |
| 2012 | 3 | 4 |
| 2013 | 6 | 9 |
| 2014 | 2 | 11 |
| 2015 | 8 | 14 |
| 2016 | 9 | 22 |
| 2017 | 14 | 19 |
| 2018 | 12 | 20 |
| 2019 | 19 | 15 |
| 2020 | 13 | 19 |
| 2021 | 22 | 23 |
| 2022 | 14 | 14 |
| 2023 | 9 | 25 |
| 2024 | 22 | 21 |
| 2025 | 14 | 14 |
| 2026 | 8 | 9 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Coated cutting tool with an alternating layer composition6 Oct 2026US 12,752,344 B2Walter AG
- High power generator and method of supplying high power pulses1 Sep 2026US 12,725,760 B2Trumpf Huettinger Sp. Z O. O.
- Film formation apparatus28 Jul 2026US 12,692,590 B2Japan Display Inc.
- High power generator and method of supplying high power pulses16 Jun 2026US 12,658,714 B2Trumpf Huettinger Sp. Z O. O.
- High power generator and method of supplying high power pulses16 Jun 2026US 12,658,715 B2Trumpf Huettinger Sp. Z O. O.
- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
- Method for manufacturing a nuclear fuel rod cladding and corresponding nuclear fuel rod cladding6 Aug 2026US 2026/0229379 A1
- High power generator, pulsing arrangement, and method of supplying a plasma process with high power pulses2 Jul 2026US 2026/0188616 A1Trumpf Huettinger Sp. Z O. O.
- High power generator, pulsing arrangement, and method of supplying a plasma process with high power pulses2 Jul 2026US 2026/0188617 A1Trumpf Huettinger Sp. Z O. O.
- Substrate processing apparatus2 Apr 2026US 2026/0094796 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- High voltage resistive output stage circuit84US 10,460,910 B2Eagle Harbor Technologies, Inc. · 2019
- Charge removal from electrodes in unipolar sputtering system79US 9,620,340 B2Advanced Energy Industries, Inc. · 2017
- Rate enhanced pulsed DC sputtering system79US 9,812,305 B2Advanced Energy Industries, Inc. · 2017
- Charge removal from electrodes in unipolar sputtering system75US 9,287,098 B2Advanced Energy Industries, Inc. · 2016
- Method of controlling ion energy distribution using a pulse generator with a current-return output stage70US 10,555,412 B2APPLIED Materials.Inc. · 2020