H01J 37/32284
Means for controlling or selecting resonance mode
Official title: {Means for controlling or selecting resonance mode}
H01J37/32284 (Means for controlling or selecting resonance mode) appears on 35 US grants and 21 published applications in this corpus.
Search patents in H01J- Granted patents
- 35
- Published applications
- 21
- Assignees
- 26
- Inventors
- 102
- Latest grant
- 26 Mar 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 3 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 3 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 1 |
| 2003 | 1 | 1 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 1 | 1 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 2 |
| 2015 | 0 | 2 |
| 2016 | 0 | 0 |
| 2017 | 2 | 3 |
| 2018 | 1 | 0 |
| 2019 | 3 | 2 |
| 2020 | 1 | 0 |
| 2021 | 0 | 2 |
| 2022 | 2 | 0 |
| 2023 | 0 | 1 |
| 2024 | 2 | 2 |
| 2025 | 0 | 1 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Bias supply with resonant switching26 Mar 2024US 11,942,309 B2Advanced Energy Industries, Inc.
- Modular reactor for microwave plasma-assisted deposition2 Jan 2024US 11,859,279 B2Diam Concept
- Microwave plasma reactor for manufacturing synthetic diamond material1 Nov 2022US 11,488,805 B2Element Six Technologies Limited
- Methods and apparatus for dynamical control of radial uniformity with two-story microwave cavities31 May 2022US 11,348,783 B2APPLIED Materials.Inc.
- Microwave plasma reactor for manufacturing synthetic diamond material4 Aug 2020US 10,734,198 B2Element Six Technologies Limited
- Microwave plasma cvd device27 Aug 2026US 2026/0253840 A1National Institute of Advanced Industrial Science and Technology
- Plasma Processing Apparatus and Method for Measuring Resonance Frequency20 Mar 2025US 2025/0095973 A1The University of Shiga Prefecture
- Plasma processing apparatus and plasma control method20 Jun 2024US 2024/0203692 A1The University of Shiga Prefecture
- Bias supply with resonant switching13 Jun 2024US 2024/0194452 A1Advanced Energy Industries, Inc.
- Bias supply with resonant switching10 Aug 2023US 2023/0253187 A1Advanced Energy Industries, Inc.
Most cited
By later US patents
- Plasma processing method and apparatus283US 6,158,383 AHitachi, Ltd. · 2000
- Method and apparatus for plasma treatment of a surface271US 5,645,645 ABoard of Trustees operating Michigan State University · 1997
- Ion generating apparatus and method for the use thereof115US 4,507,588 ABoard of Trustees operating Michigan State University · 1985
- Plasma generating apparatus using magnets and method70US 4,727,293 ABoard of Trustees operating Michigan State University · 1988
- Dual plasma microwave apparatus and method for treating a surface68US 4,691,662 AMichigan State University · 1987