Modular reactor for microwave plasma-assisted deposition

A microwave plasma-assisted modular deposition reactor for manufacturing synthetic diamond, the reactor comprising:

• a microwave generator configured to generate microwaves, the frequency of which is between 300 MHz and 3000 MHz,
• a resonant cavity formed, at least in part, by cylindrical inner walls of a reactor enclosure,
• a wave coupling module adapted to transfer the microwaves from the microwave generator to the resonant cavity in order to allow the formation of a plasma,
• a growth support present in the resonant cavity,
• a substrate holder module, mobile in vertical translation and in rotation, in contact with a quarter-wave and including at least one fluid cooling system,
• a first crown adapted to be positioned between a first enclosure part and a second enclosure part in order to change a shape and/or volume of the resonant cavity, and a first seal system, allowing for vacuum tightness and electrical continuity of the walls of the reactor enclosure, being arranged between the first crown and the first enclosure part and the second enclosure part, respectively,
• a second crown adapted to be positioned between the second enclosure part and a third enclosure part in order to change a shape and/or volume of the resonant cavity, and a second seal system, allowing for the vacuum tightness and electrical continuity of the walls of the reactor enclosure, being arranged between the second crown and the second enclosure part and the third enclosure part, respectively,
• the first crown or the second crown comprising a dielectric observation window, and
• at least one modulation element, the at least one modulation element being selected from:
• a tray mobile in vertical translation in order to change the shape and volume of the resonant cavity and including through openings allowing the gases to pass;
• a gas distribution module, including:
• a removable gas distribution plate comprising an inner surface, an outer surface and a plurality of gas distribution nozzles forming channels between the surfaces adapted to conduct a gas flow, and
• a support device connected to a cooling system and adapted to accommodate the removable gas distribution plate;
• and
• a substrate cooling control module, including a removable thermal resistance gas injection device, the removable thermal resistance gas injection device comprising one or more thermal resistance gas inputs and one or more thermal resistance gas outputs.