H01J 37/29
Reflection microscopes
H01J37/29 (Reflection microscopes) appears on 137 US grants and 143 published applications in this corpus.
Search patents in H01J- Granted patents
- 137
- Published applications
- 143
- Assignees
- 51
- Inventors
- 298
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 2 | 4 |
| 2004 | 3 | 2 |
| 2005 | 3 | 4 |
| 2006 | 3 | 5 |
| 2007 | 4 | 10 |
| 2008 | 6 | 4 |
| 2009 | 5 | 4 |
| 2010 | 4 | 1 |
| 2011 | 5 | 3 |
| 2012 | 3 | 5 |
| 2013 | 6 | 3 |
| 2014 | 7 | 10 |
| 2015 | 8 | 11 |
| 2016 | 9 | 12 |
| 2017 | 6 | 6 |
| 2018 | 14 | 10 |
| 2019 | 13 | 15 |
| 2020 | 11 | 7 |
| 2021 | 7 | 7 |
| 2022 | 4 | 5 |
| 2023 | 2 | 6 |
| 2024 | 2 | 6 |
| 2025 | 3 | 1 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Autofocus method for single beam and multi-beam systems26 May 2026US 12,640,337 B2KLA Corporation
- Leveling sensor in multiple charged-particle beam inspection21 Oct 2025US 12,451,324 B2ASML Netherlands B. V.
- Surface analysis system comprising a pulsed electron source12 Aug 2025US 12,387,901 B2Centre National De La Recherche Scientifique
- Multiple charged-particle beam apparatus with low crosstalk28 Jan 2025US 12,211,669 B2ASML Netherlands B. V.
- Arbitrary electron dose waveforms for electron microscopy3 Sep 2024US 12,080,514 B2Integrated Dynamic Electron Solutions, Inc.
- Apparatus and method for improved electron beam inspection with a charge treatment electron source30 Apr 2026US 2026/0120989 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflectance confocal scanning electron microscope and operating method thereof21 Aug 2025US 2025/0266237 A1Samsung Electronics Co., Ltd.
- Autofocus method for single beam and multi-beam systems12 Dec 2024US 2024/0412944 A1KLA Corporation
- Inspection apparatus and method7 Nov 2024US 2024/0369356 A1ASML Netherlands B. V.
- Multiple charged particle beam system with a mirror mode of operation, method for operating a multi-beam charged particle microscope system with a mirror mode of operation and associated computer program product7 Nov 2024US 2024/0371596 A1
Most cited
By later US patents
- Multi-pixel electron emission die-to-die inspection87US 6,897,444 B1KLA-Tencor Technologies Corporation · 2005
- Electrical process monitoring using mirror-mode electron microscopy85US 7,514,681 B1KLA-Tencor Technologies Corporation · 2009
- Focusing system and method for a charged particle imaging system47US 7,696,497 B2Applied Materials Israel Ltd. · 2010
- Apparatus of plural charged-particle beams41US 10,141,160 B2Hermes Microvision, Inc. · 2018
- High throughput multi beam detection system and method37US 7,504,622 B2Applied Materials Israel Ltd. · 2009