Surface analysis system comprising a pulsed electron source

A system for performing surface analysis on a material, comprising:

• a pulsed monochromatic electron source, allowing a monochromatic beam of incident electrons to be formed;
• means for conveying all or some of the incident electrons to the surface of a sample of material, so as to form backscattered electrons, and all or some of the backscattered electrons to detecting means, said conveying means comprising at least one electron optical system, and preferably a plurality of electron optical systems;
• means for detecting all or some of the backscattered electrons, wherein the pulsed monochromatic electron source comprises:
• a source of atoms;
• at least one continuous-wave laser beam configured to form a laser excitation zone able to excite at least some of said atoms to Rydberg states;
• means for generating a pulsed electric field (F) on either side of the laser excitation zone, said pulsed electric field being configured to ionize at least some of the excited atoms and to form a monochromatic beam of electrons, the amplitude of said pulsed electric field being comprised between 5 and 50 V/cm.