H01J 37/292
Using scanning ray
Official title: {using scanning ray}
H01J37/292 (Using scanning ray) appears on 52 US grants and 58 published applications in this corpus.
Search patents in H01J- Granted patents
- 52
- Published applications
- 58
- Assignees
- 23
- Inventors
- 117
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2002 | 1 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 1 |
| 2007 | 0 | 1 |
| 2008 | 1 | 0 |
| 2009 | 2 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 1 | 2 |
| 2013 | 1 | 1 |
| 2014 | 1 | 2 |
| 2015 | 3 | 6 |
| 2016 | 5 | 7 |
| 2017 | 3 | 3 |
| 2018 | 8 | 5 |
| 2019 | 7 | 7 |
| 2020 | 6 | 3 |
| 2021 | 3 | 4 |
| 2022 | 2 | 4 |
| 2023 | 2 | 4 |
| 2024 | 2 | 4 |
| 2025 | 2 | 1 |
| 2026 | 1 | 0 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Autofocus method for single beam and multi-beam systems26 May 2026US 12,640,337 B2KLA Corporation
- Leveling sensor in multiple charged-particle beam inspection21 Oct 2025US 12,451,324 B2ASML Netherlands B. V.
- Multiple charged-particle beam apparatus with low crosstalk28 Jan 2025US 12,211,669 B2ASML Netherlands B. V.
- Arbitrary electron dose waveforms for electron microscopy3 Sep 2024US 12,080,514 B2Integrated Dynamic Electron Solutions, Inc.
- Inspection apparatus and method27 Aug 2024US 12,072,181 B2ASML Netherlands B. V.
- Reflectance confocal scanning electron microscope and operating method thereof21 Aug 2025US 2025/0266237 A1Samsung Electronics Co., Ltd.
- Autofocus method for single beam and multi-beam systems12 Dec 2024US 2024/0412944 A1KLA Corporation
- Inspection apparatus and method7 Nov 2024US 2024/0369356 A1ASML Netherlands B. V.
- Non-destructive sem-based depth-profiling of samples21 Mar 2024US 2024/0094150 A1Applied Materials Israel Ltd.
- Multi-beam microscope and method for operating a multi-beam microscope using settings adjusted to an inspection site14 Mar 2024US 2024/0087838 A1
Most cited
By later US patents
- Electrical process monitoring using mirror-mode electron microscopy85US 7,514,681 B1KLA-Tencor Technologies Corporation · 2009
- Apparatus of plural charged-particle beams41US 10,141,160 B2Hermes Microvision, Inc. · 2018
- Particle beam system and method for the particle-optical examination of an object36US 10,535,494 B2Carl Zeiss Microscopy GmbH · 2020
- Object observation apparatus and object observation33US 6,479,819 B1Nikon Corporation · 2002
- Charged particle beam substrate inspection using both vector and raster scanning16US 9,466,463 B1Multibeam Corporation · 2016