Inspection apparatus and method
AssigneeASML Netherlands B.V.
InventorsYan Wang, Jian Zhang, Zhiwen Kang, Yixiang Wang
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AssigneeASML Netherlands B.V.
InventorsYan Wang, Jian Zhang, Zhiwen Kang, Yixiang Wang
Estimating the term…
An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.
An inspection apparatus comprising:
A non-transitory computer-readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
An inspection apparatus comprising:
Dependencies are inferred from the claim text.