Multiple charged-particle beam apparatus with low crosstalk
AssigneeASML Netherlands B.V.
InventorsWeiming Ren, Zizhou Gong, Xuerang Hu, Xuedong Liu, Zhong-wei Chen
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AssigneeASML Netherlands B.V.
InventorsWeiming Ren, Zizhou Gong, Xuerang Hu, Xuedong Liu, Zhong-wei Chen
Estimating the term…
Systems and methods of forming images of a sample using a multi-beam apparatus are disclosed. The method may include generating a plurality of secondary electron beams from a plurality of probe spots on the sample upon interaction with a plurality of primary electron beams. The method may further include adjusting an orientation of the plurality of primary electron beams interacting with the sample, directing the plurality of secondary electron beams away from the plurality of primary electron beams, compensating astigmatism aberrations of the plurality of directed secondary electron beams, focusing the plurality of directed secondary electron beams onto a focus plane, detecting the plurality of focused secondary electron beams by a charged-particle detector, and positioning a detection plane of the charged-particle detector at or close to the focus plane.
A method performed by a multi-beam apparatus to form images of a sample, the method comprising:
A multi-beam apparatus for inspecting a sample using a plurality of primary electron beams configured to form a plurality of probe spots on the sample, the multi- beam apparatus comprising:
Dependencies are inferred from the claim text.