H01J 27/18
With an applied axial magnetic field
Official title: with an applied axial magnetic field
H01J27/18 (With an applied axial magnetic field) appears on 135 US grants and 60 published applications in this corpus.
Search patents in H01J- Granted patents
- 135
- Published applications
- 60
- Assignees
- 84
- Inventors
- 297
- Latest grant
- 21 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 3 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 4 | 0 |
| 1987 | 4 | 0 |
| 1988 | 6 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 6 | 0 |
| 1992 | 1 | 0 |
| 1993 | 4 | 0 |
| 1994 | 5 | 0 |
| 1995 | 1 | 0 |
| 1996 | 8 | 0 |
| 1997 | 4 | 0 |
| 1998 | 4 | 0 |
| 1999 | 5 | 0 |
| 2000 | 3 | 0 |
| 2001 | 5 | 1 |
| 2002 | 2 | 0 |
| 2003 | 3 | 5 |
| 2004 | 7 | 7 |
| 2005 | 4 | 0 |
| 2006 | 0 | 3 |
| 2007 | 4 | 3 |
| 2008 | 3 | 1 |
| 2009 | 5 | 4 |
| 2010 | 0 | 7 |
| 2011 | 3 | 2 |
| 2012 | 2 | 3 |
| 2013 | 3 | 1 |
| 2014 | 7 | 3 |
| 2015 | 1 | 3 |
| 2016 | 2 | 1 |
| 2017 | 4 | 3 |
| 2018 | 1 | 3 |
| 2019 | 4 | 2 |
| 2020 | 0 | 1 |
| 2021 | 2 | 3 |
| 2022 | 2 | 1 |
| 2023 | 1 | 2 |
| 2024 | 2 | 0 |
| 2025 | 1 | 1 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mixed-gas species plasma source system21 Apr 2026US 12,609,276 B2FEI Company
- Accelerator and particle therapy system25 Mar 2025US 12,261,011 B2Hitachi High-Tech Corporation
- Cyclotron having continuously variable energy output1 Oct 2024US 12,106,925 B2APPLIED Materials.Inc.
- Automatic adjustment method and automatic adjustment device of beam of semiconductor apparatus, and training method of parameter adjustment model9 Apr 2024US 11,955,309 B2United Microelectronics Corp.
- Modular microwave source with local lorentz force8 Aug 2023US 11,721,532 B2APPLIED Materials.Inc.
- Mixed-gas species plasma source system26 Jun 2025US 2025/0210303 A1FEI Company
- Accelerator and particle therapy system7 Sep 2023US 2023/0282436 A1Hitachi, Ltd.
- Cyclotron having continuously variable energy output29 Jun 2023US 2023/0207247 A1APPLIED Materials.Inc.
- Automatic adjustment method and automatic adjustment device of beam of semiconductor apparatus, and training method of parameter adjustment model1 Dec 2022US 2022/0384139 A1United Microelectronics Corp.
- Specific type ion source and plasma film forming apparatus30 Sep 2021US 2021/0305016 A1National University Corporation Kyoto Institute of Technology
Most cited
By later US patents
- Ion source having auxillary ion chamber423US 5,107,170 ANissin Electric Co., Ltd. · 1992
- Method for producing recording media having protective overcoats of highly tetrahedral amorphous carbon122US 5,858,477 AAkashic Memories Corporation · 1999
- Electron cyclotron resonance plasma source110US 4,778,561 AVeeco Instruments Inc. · 1988
- Production of large resonant plasma volumes in microwave electron cyclotron resonance ion sources78US 5,841,237 ALockheed Martin Energy Research Corporation · 1998
- Dual plasma microwave apparatus and method for treating a surface68US 4,691,662 AMichigan State University · 1987