Mixed-gas species plasma source system

An ion beam system, comprising:

• a plasma source tube defining a plasma source chamber;
• a first gas reservoir housing a first gas species and a second gas reservoir housing a second gas species;
• a first controller fluidly coupled to the first gas reservoir and configured to control a first flow rate of the first gas species;
• a second controller fluidly coupled to the second gas reservoir and configured to control a second flow rate of the second gas species;
• a first capillary constriction including a first end fluidly coupled to the first controller and a second end fluidly coupled to the plasma source chamber;
• and
• a second capillary constriction including a third end fluidly coupled to the second controller and a fourth end fluidly coupled to the plasma source chamber, wherein the first capillary constriction and the second capillary constriction are separated from each other.

An ion beam system, comprising:

• a plasma source tube defining a plasma source chamber;
• a first gas reservoir housing a first gas species and a second gas reservoir housing a second gas species;
• a first controller fluidly coupled to the first gas reservoir and configured to control a first flow rate of the first gas species;
• a first capillary constriction including a first end fluidly coupled to the first controller and a second end fluidly coupled to the plasma source chamber;
• and
• a bypass manifold coupled to the plasma source tube, wherein:
• the bypass manifold defines a bypass chamber in fluid communication with the plasma source chamber;
• and
• the second end of the first capillary constriction is coupled to the bypass manifold.