Automatic adjustment method and automatic adjustment device of beam of semiconductor apparatus, and training method of parameter adjustment model

A automatic adjustment device of a beam of a semiconductor apparatus, comprising:

• an input unit, configured to obtain a wave curve of the beam and a plurality of environmental factors of the semiconductor apparatus;
• a segmentation unit, configured to segment the wave curve into a plurality of sections;
• a calculation unit, configured to calculate a slope of each of the sections;
• and
• a parameter adjustment model, configured to analyze at least one parameter adjustment command of the semiconductor apparatus according to the slopes and the environmental factors.

A training method of a parameter adjustment model of a semiconductor apparatus, wherein the semiconductor apparatus has a beam, and the training method comprises:

• obtaining a plurality of environmental factors of the semiconductor apparatus;
• obtaining a parameter adjustment command of the semiconductor apparatus;
• generating the beam by the semiconductor apparatus according to the parameter adjustment command;
• obtaining a wave curve of the beam;
• segmenting the wave curve into a plurality of sections;
• obtaining a slope of each of the sections;
• and
• training the parameter adjustment model according to the environmental factors, the slopes and the parameter adjustment command.