Modular microwave source with local lorentz force

A plasma processing tool, comprising:

• a processing chamber confining a processing volume;
• and
• a plurality of modular microwave sources coupled to the processing chamber, wherein the plurality of modular microwave sources comprise:
• an array of applicators positioned over a dielectric that forms a portion of an outer wall of the processing chamber, wherein each applicator of the array of applicators is in a first plane, and the dielectric is in a second plane, the second plane parallel with the first plane;
• an array of microwave amplification modules, wherein each microwave amplification module is coupled to one or more of the applicators in the array of applicators;
• and
• a plurality of magnets, wherein each of the plurality of magnets laterally surrounds a corresponding applicator of the array of applicators in the first plane, and wherein the plurality of magnets are electrically coupled to each other in series in the first plane.