H01J 27/143
Hall-effect ion sources with closed electron drift
Official title: {Hall-effect ion sources with closed electron drift}
H01J27/143 (Hall-effect ion sources with closed electron drift) appears on 55 US grants and 39 published applications in this corpus.
Search patents in H01J- Granted patents
- 55
- Published applications
- 39
- Assignees
- 35
- Inventors
- 110
- Latest grant
- 16 Jul 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 3 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 0 |
| 2002 | 2 | 1 |
| 2003 | 0 | 2 |
| 2004 | 1 | 4 |
| 2005 | 4 | 7 |
| 2006 | 5 | 4 |
| 2007 | 3 | 1 |
| 2008 | 4 | 5 |
| 2009 | 4 | 0 |
| 2010 | 0 | 1 |
| 2011 | 1 | 1 |
| 2012 | 1 | 2 |
| 2013 | 1 | 1 |
| 2014 | 0 | 0 |
| 2015 | 2 | 0 |
| 2016 | 1 | 2 |
| 2017 | 0 | 2 |
| 2018 | 2 | 1 |
| 2019 | 2 | 0 |
| 2020 | 0 | 1 |
| 2021 | 1 | 1 |
| 2022 | 2 | 2 |
| 2023 | 1 | 1 |
| 2024 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Ion gun16 Jul 2024US 12,040,153 B2Ulvac, Inc.
- Ion gun and vacuum processing apparatus7 Nov 2023US 11,810,748 B2Canon Anelva Corporation
- Ion gun and vacuum processing apparatus6 Dec 2022US 11,521,822 B2Canon Anelva Corporation
- Ion source and method4 Jan 2022US 11,217,426 B2Von Ardenne Asset GmbH & Co. KG
- Single beam plasma source29 Jun 2021US 11,049,697 B2Board of Trustees of Michigan State University
- Ion gun and vacuum processing apparatus18 May 2023US 2023/0154721 A1Canon Anelva Corporation
- Ion gun and vacuum processing apparatus22 Sep 2022US 2022/0301807 A1Canon Anelva Corporation
- Ion gun15 Sep 2022US 2022/0293388 A1Ulvac, Inc.
- Ion source and method2 Dec 2021US 2021/0375584 A1Von Ardenne Asset GmbH & Co. KG
- Single beam plasma source24 Sep 2020US 2020/0303168 A1Board of Trustees of Michigan State University
Most cited
By later US patents
- Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ion-emitting slit105US 6,002,208 AAdvanced Ion Technology, Inc. · 1999
- Gridless ion source for the vacuum processing of materials61US 5,973,447 AMonsanto Company · 1999
- Cold-cathode ion source with a controlled position of ion beam57US 6,037,717 AAdvanced Ion Technology, Inc. · 2000
- Closed drift ion source with improved magnetic field51US 5,763,989 AFront Range Fakel, Inc. · 1998
- Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ionization gap44US 6,147,354 A2000