H01J 27/08
Using arc discharge
Official title: using arc discharge
H01J27/08 (Using arc discharge) appears on 411 US grants and 242 published applications in this corpus.
Search patents in H01J- Granted patents
- 411
- Published applications
- 242
- Assignees
- 164
- Inventors
- 716
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 1 | 0 |
| 1978 | 5 | 0 |
| 1979 | 4 | 0 |
| 1980 | 1 | 0 |
| 1981 | 4 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 7 | 0 |
| 1985 | 6 | 0 |
| 1986 | 1 | 0 |
| 1987 | 11 | 0 |
| 1988 | 12 | 0 |
| 1989 | 6 | 0 |
| 1990 | 9 | 0 |
| 1991 | 7 | 0 |
| 1992 | 7 | 0 |
| 1993 | 4 | 0 |
| 1994 | 12 | 0 |
| 1995 | 4 | 0 |
| 1996 | 8 | 0 |
| 1997 | 8 | 0 |
| 1998 | 12 | 0 |
| 1999 | 16 | 0 |
| 2000 | 11 | 0 |
| 2001 | 9 | 4 |
| 2002 | 7 | 9 |
| 2003 | 12 | 13 |
| 2004 | 14 | 13 |
| 2005 | 14 | 12 |
| 2006 | 13 | 17 |
| 2007 | 12 | 14 |
| 2008 | 11 | 16 |
| 2009 | 14 | 11 |
| 2010 | 13 | 7 |
| 2011 | 6 | 9 |
| 2012 | 10 | 6 |
| 2013 | 8 | 10 |
| 2014 | 11 | 13 |
| 2015 | 15 | 7 |
| 2016 | 7 | 10 |
| 2017 | 3 | 8 |
| 2018 | 9 | 4 |
| 2019 | 11 | 2 |
| 2020 | 5 | 11 |
| 2021 | 10 | 6 |
| 2022 | 6 | 10 |
| 2023 | 11 | 9 |
| 2024 | 7 | 7 |
| 2025 | 6 | 10 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Ion generation device and ion implanter18 Aug 2026US 12,712,144 B2Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Systems and methods for aluminum ion beam generation source technology24 Mar 2026US 12,586,756 B2II-Vi Delaware, Inc.
- Shielded gas inlet for an ion source18 Nov 2025US 12,476,085 B2Axcelis Technologies, Inc.
- Adjustable support for arc chamber of ion source9 Sep 2025US 12,412,725 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Deposition apparatus24 Jun 2025US 12,338,526 B2Canon Anelva Corporation
- Devices and Methods for Creation of Exotic Vacuum Objects13 Aug 2026US 2026/0237588 A1Magnetic Miles, LLC
- Ion implantation method and solid source material used for ion generation26 Feb 2026US 2026/0058087 A1Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Shielded gas inlet for an ion source19 Feb 2026US 2026/0051459 A1Axcelis Technologies, Inc.
- Ion source with multiple integrated arc chambers1 Jan 2026US 2026/0004987 A1Axcelis Technologies, Inc.
- Granular sputter source target with repeller cup and method for use thereof11 Dec 2025US 2025/0379023 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Ion source231US 6,645,301 B2Saintech Pty Ltd. · 2003
- Ion source167US 6,849,854 B2Saintech Pty Ltd. · 2005
- End-Hall ion source119US 4,862,032 A1989
- Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ion-emitting slit105US 6,002,208 AAdvanced Ion Technology, Inc. · 1999
- Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample88US 8,779,400 B2Hitachi High-Technologies Corporation · 2014