Shielded gas inlet for an ion source
AssigneeAxcelis Technologies, Inc.
InventorsNeil K. Colvin, Neil Bassom, Joshua Abeshaus
Life of this patent
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AssigneeAxcelis Technologies, Inc.
InventorsNeil K. Colvin, Neil Bassom, Joshua Abeshaus
Estimating the term…
An ion source has arc chamber having one or more radiation generating features, an arc chamber body enclosing an internal volume, and at least one gas inlet aperture defined therein. A gas source provides a gas such as a source species gas or a halide through the gas inlet aperture. The source species gas can be an aluminum-based ion source material such as dimethylaluminum chloride (DMAC). One or more shields positioned proximate to the gas inlet aperture provide a fluid communication between the gas inlet aperture and the internal volume, minimize a line-of-sight from the one or more radiation generating features to the gas inlet aperture, and substantially prevent thermal radiation from reaching the gas inlet aperture from the one or more radiation generating features.
An ion source comprising:
An ion source comprising:
An ion source comprising:
An ion source comprising:
An ion source comprising:
Dependencies are inferred from the claim text.