Deposition apparatus
AssigneeCanon Anelva Corporation
InventorMasahiro Atsumi
Life of this patent
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Abstract
A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
Claims9
A deposition apparatus which forms a film on a substrate, comprising:
- a moving unit configured to move a target along a moving axis;
- a striker configured to generate an arc discharge;
- an anode arranged to face the target;
- a driving unit configured to perform rotation-drive of the striker so as to make a close state which the striker closes to a side surface around the moving axis of the target to generate the arc discharge;
- and
- a control unit that is configured to control movement of the target by the moving unit so as to change a facing position on the side surface of the target facing the striker in the state,
- wherein an axis of the rotation-drive of the striker is parallel to the moving axis;
- and
- wherein the control unit is further configured to automatically change the facing position on the side surface of the target each time the arc discharge is generated, and
- wherein the driving unit drives the striker such that a distance between the anode and the striker in the close state becomes constant.
A deposition apparatus which forms a film on a substrate, comprising:
- a rotation unit configured to rotate a target about a rotating axis;
- a striker configured to generate an arc discharge;
- an anode arranged to face the target;
- a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge;
- and
- a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state,
- wherein the arc discharge occurs on the side surface of the target, and
- wherein the control unit is further configured to automatically change the facing position on the side surface of the target each time the arc discharge is generated, and
- wherein the driving unit drives the striker such that a distance between the anode and the striker in the close state becomes constant.
A deposition apparatus which forms a film on a substrate, comprising:
- a moving unit configured to move a target along an axis;
- a striker configured to generate an arc discharge;
- an anode arranged to face the target;
- a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the axis of the target to generate the arc discharge;
- and
- a control unit configured to control movement of the target by the moving unit so as to change a facing position on the side surface of the target facing the striker in the close state,
- wherein the arc discharge occurs on the side surface of the target, and
- wherein the control unit is further configured to automatically change the facing position on the side surface of the target each time the arc discharge is generated, and
- wherein the driving unit drives the striker such that a distance between the anode and the striker in the close state becomes constant.
Dependencies are inferred from the claim text.