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US 11,049,697 B2Granted
Single beam plasma source
AssigneesBoard of Trustees of Michigan State University, Fraunhofer USA, Inc.
InventorsQi Hua Fan, Thomas Schuelke, Lars Haubold, Michael Petzold
Life of this patent
Estimating the term…
Abstract
A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.
Claims33
An ion source apparatus comprising:
- (a) an anode comprising at least one magnetic conductor inwardly extending toward an ion emission axis, an open plasma area being located within a hollow central area of the anode;
- (b) a cathode comprising a cap having a single outlet opening therethough, the outlet opening being aligned with the axis;
- (c) magnetic flux lines extending between uppermost and lowermost sections of the at least one magnetic conductor inside the hollow central area of the anode, the magnetic flux lines including a central outward dip adjacent a middle section of the at least one magnetic conductor, the dip of the magnetic flux lines being in the open plasma area, and the dip changing movement of electrons adjacent the dip to increase ionization within a plasma inside the anode;
- and
- (d) additional magnetic flux lines originating adjacent the uppermost section of the at least one magnetic conductor adjacent the outlet opening, and outwardly radiating therefrom substantially parallel to the ion emission axis and laterally external to the hollow central area of the anode.
2 more elements
An ion source apparatus comprising:
- (a) an anode comprising at least one magnetic conductor inwardly extending toward an ion emission axis, an open plasma area being located within a hollow central area of the anode;
- (b) a cathode comprising a cap having a single outlet opening therethough, the outlet opening being aligned with the axis;
- (c) magnetic flux lines extending between uppermost and lowermost sections of the at least one magnetic conductor, the magnetic flux lines including a central outward dip adjacent a middle section of the at least one magnetic conductor, the dip of the magnetic flux lines being in the open plasma area, and the dip changing movement of electrons adjacent the dip to increase ionization within a plasma inside the anode;
- (d) a vacuum chamber containing a precursor gas;
- (e) a sputter target located in the vacuum chamber receiving the single ion beam;
- and
- (f) the at least one magnetic conductor including at least three spaced apart shunts with the uppermost section being a first of the shunts and the lowermost section being a third of the shunts with the middle section being a second shunt located therebetween.
4 more elements
An ion source apparatus comprising:
- (a) an anode comprising magnetic conductors inwardly extending toward an ion emission axis, an open plasma area being located within a hollow central area of the anode;
- (b) a cathode comprising a cap having a single outlet opening therethough, the outlet opening being aligned with the axis;
- (c) permanent magnets located between the magnetic conductors in a stacked arrangement;
- (d) the magnetic conductors comprising metallic shunts inwardly projecting toward the axis further than the permanent magnets;
- and
- (e) magnetic flux lines extending between uppermost and lowermost of the shunts, the magnetic flux lines including a central outward dip adjacent a middle section of the magnetic conductors, the dip of the magnetic flux lines being in the open plasma area, and the dip changing movement of electrons adjacent the dip to increase ionization within a plasma inside the anode.
3 more elements
An ion source apparatus comprising:
- (a) an anode comprising at least one magnetic conductor inwardly extending toward an ion emission axis, an open plasma area being located within a hollow central area of the anode;
- (b) a cathode comprising a cap having a single outlet opening therethough, the outlet opening being aligned with the axis;
- (c) magnetic flux lines extending between uppermost and lowermost sections of the at least one magnetic conductor, the magnetic flux lines including a central outward dip adjacent a middle section of the at least one magnetic conductor, the dip of the magnetic flux lines being in the open plasma area;
- and
- (d) the anode further comprising a curved side wall and an enclosed base wall, both of which directly emit an electric field, and the side wall of the anode surrounding the middle section of the at least one magnetic conductor and the dip of the magnetic flux lines.
2 more elements
Dependencies are inferred from the claim text.