H01J 2237/3156
Curing
H01J2237/3156 (Curing) appears on 16 US grants and 18 published applications in this corpus.
Search patents in H01J- Granted patents
- 16
- Published applications
- 18
- Assignees
- 15
- Inventors
- 52
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2002 | 0 | 1 |
| 2003 | 0 | 0 |
| 2004 | 1 | 3 |
| 2005 | 1 | 3 |
| 2006 | 1 | 2 |
| 2007 | 3 | 2 |
| 2008 | 0 | 0 |
| 2009 | 1 | 1 |
| 2010 | 2 | 2 |
| 2011 | 1 | 1 |
| 2012 | 0 | 1 |
| 2013 | 2 | 0 |
| 2014 | 1 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 1 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 1 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 1 | 1 |
| 2026 | 1 | 0 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Electron beam curing of clear and pigmented coatings for the coil industry and method thereof25 Aug 2026US 12,719,016 B2Energy Sciences Inc.
- Methods of post-curing additive manufacturing parts using electron beams29 Apr 2025US 12,285,915 B2Ford Global Technologies, LLC
- Elastic fiber containing an anti-tack additive7 Aug 2018US 10,039,855 B2Invista North America S A R L
- Charging-free electron beam cure of dielectric material3 Jun 2014US 8,741,782 B2International Business Machines Corporation
- Charging-free electron beam cure of dielectric material3 Sep 2013US 8,525,123 B2International Business Machines Corporation
- Electron beam curing of clear and pigmented coatings for the coil industry and method thereof3 Apr 2025US 2025/0112025 A1Energy Sciences Inc.
- Methods of post-curing additive manufacturing parts using electron beams28 Oct 2021US 2021/0331394 A1Ford Global Technologies, LLC
- Charging-free electron beam cure of dielectric material29 Nov 2012US 2012/0302011 A1International Business Machines Corporation
- Elastic fiber containing an anti-tack additive23 Jun 2011US 2011/0152810 A1Invista North America S A R L
- Electron beam annealing apparatuses and annealing methods using the same17 Jun 2010US 2010/0147807 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Vacuum reaction chamber with x-lamp heater8US 7,777,197 B2APPLIED Materials.Inc. · 2010
- Film-processing method and film-processing apparatus5US 6,903,800 B2Tokyo Electron Limited · 2005
- Surface processing apparatus4US 7,005,660 B2Tokyo Electron Limited · 2006
- Thin film processing method and system4US 7,195,936 B2Tokyo Electron Limited · 2007
- Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object2US 7,205,558 B2TDK Corporation · 2007