Thin film processing method and system
AssigneeTokyo Electron Limited
InventorsTadashi Onishi, Manabu Hama, Minoru Honda, Kazuyuki Mitsuoka, Mitsuaki Iwashita
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Abstract
In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.
Claims7
A thin film processing method comprising the steps of:
- irradiating electron beams from a plurality of electron beam tubes onto a film formed on an object to be processed, the film having a varying thickness, to regulate the thickness;
- and
- forming the film by CVD,
- wherein output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness.
A thin film processing method comprising the step of:
- irradiating electron beams from a plurality of electron beam tubes onto a film formed on an object to be processed, the film having a varying thickness, to regulate the thickness,
- wherein output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness, and
- wherein an electron beam tube disposed at an outer portion of the object has a higher output power than an electron beam tube disposed at an inner portion of the object.
A thin film processing system comprising:
- a film thickness measuring device for measuring a thickness of a film formed on an object to be processed;
- and
- an electron beam processor including a plurality of electron beam tubes for irradiating electron beams onto the film of the object and a controller for individually controlling output powers or beam irradiation times of the electron beam tubes based on a measurement result taken by the film thickness measuring devices,
- wherein the electron beam tubes are substantially concentrically disposed.
Dependencies are inferred from the claim text.