Surface processing apparatus
AssigneeTokyo Electron Limited
InventorsMinoru Honda, Ryo Nonaka, Kazuyuki Mitsuoka
Life of this patent
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Abstract
A surface processing apparatus which enables the electron beam energy to be reduced with a simplified construction. A wafer W as an object to be processed is placed in a processing chamber. The wafer is mounted on a mounting stage inside the processing chamber. An electron beam irradiating device is provided on the processing chamber such as to face the mounting stage and irradiates at least one electron beam toward the wafer. A self-generated electric field generator is provided between the electron beam irradiating device and the mounting stage and generates at least one self-generated electric field.
Claims17
A surface processing apparatus comprising:
- a processing chamber inside which an object to be processed is processed;
- a mounting stage that is provided inside said processing chamber and on which the object to be processed is mounted;
- an electron beam irradiating device that is provided on said processing chamber such as to face said mounting stage and irradiates at least one electron beam toward the object to be processed;
- and
- a self-generated electric field generator that is provided between said electron beam irradiating device and said mounting stage and generates at least one self-generated electric field such that energy of the at least one electron beam is reduced.
Dependencies are inferred from the claim text.