Electron beam annealing apparatuses and annealing methods using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJung-hyun Lee, Jong-min Kim, Dong-joon Ma, Chang-soo Lee
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Abstract
Electron beam annealing apparatuses for annealing a thin layer on a substrate and annealing methods using the apparatuses are provided. The electron beam annealing apparatuses may include an electron beam scanning unit that may scan a pulsed electron beam onto a substrate.
Claims18
An electron beam annealing apparatus, comprising an electron beam scanning unit configured to scan a pulsed electron beam onto a substrate during an annealing process.
An electron beam annealing apparatus, the apparatus comprising:
- a chamber configured to mount a substrate and supply a reaction gas into the chamber;
- an electron beam scanning unit configured to scan a pulsed electron beam onto the substrate;
- and
- a bias applying unit configured to apply a bias voltage to the substrate.
An electron beam annealing method, the method comprising scanning a pulsed electron beam onto a substrate.
An electron beam annealing method for annealing a thin layer deposited on a substrate, the method comprising:
- mounting the substrate in a chamber;
- scanning a pulsed electron beam onto the substrate;
- supplying a reaction gas to the chamber;
- and
- applying a bias voltage to the substrate.
Dependencies are inferred from the claim text.