H01J 2237/3137
Plasma-assisted co-operation
H01J2237/3137 (Plasma-assisted co-operation) appears on 20 US grants and 23 published applications in this corpus.
Search patents in H01J- Granted patents
- 20
- Published applications
- 23
- Assignees
- 25
- Inventors
- 73
- Latest grant
- 13 Feb 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 1 |
| 2004 | 1 | 1 |
| 2005 | 0 | 4 |
| 2006 | 1 | 0 |
| 2007 | 0 | 1 |
| 2008 | 0 | 1 |
| 2009 | 1 | 2 |
| 2010 | 1 | 1 |
| 2011 | 0 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 1 |
| 2017 | 0 | 3 |
| 2018 | 2 | 1 |
| 2019 | 1 | 1 |
| 2020 | 1 | 0 |
| 2021 | 0 | 1 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
| 2024 | 1 | 0 |
| 2025 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Method and device for the surface treatment of substrates13 Feb 2024US 11,901,172 B2EV Group E. Thallner GmbH
- Method and device for the surface treatment of substrates15 Dec 2020US 10,867,783 B2EV Group E. Thallner GmbH
- Charged-particle microscope with in situ deposition functionality12 Nov 2019US 10,475,629 B2FEI Company
- Virtual cathode deposition (VCD) for thin film manufacturing14 Aug 2018US 10,047,432 B2Plasma App Ltd.
- Method and device for the surface treatment of substrates1 May 2018US 9,960,030 B2EV Group E. Thallner GmbH
- Electron beam device for surface treatment16 Oct 2025US 2025/0323006 A1
- Etching apparatus25 May 2023US 2023/0162996 A1APPLIED Materials.Inc.
- Method and device for the surface treatment of substrates29 Apr 2021US 2021/0125821 A1EV Group E. Thallner GmbH
- Etching apparatus26 Dec 2019US 2019/0393053 A1
- Method and device for the surface treatment of substrates19 Jul 2018US 2018/0204717 A1EV Group E. Thallner GmbH
Most cited
By later US patents
- Method for anisotropic etching conductive film100US 5,719,068 ASemiconductor Energy Laboratory Co.Ltd. · 1998
- Apparatus for coating substrates61US 5,656,141 ALeybold Aktiengesellschaft · 1997
- Apparatus for plasma-assisted high rate electron beam vaporization21US 5,635,087 AFraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e. V. · 1997
- Plasma and electron beam etching device and method14US 7,569,484 B2Micron Technology, Inc. · 2009
- Process and apparatus for plasma activated depositions in a vacuum12US 7,014,889 B2University of Virginia Patent Foundation · 2006