US 5,656,141 A · Apparatus for coating substrates

Abstract

Apparatus for coating substrates 31, 31", . . . in a vacuum chamber 2 including a substrate carrier 30 disposed therein and a device 29 for generating a first plasma cloud 28 and, further, including magnets 26, 27 directing the plasma cloud 28 onto the surface of the substrates 31, 31" . . . wherein this device for generating the plasma cloud 28 has an election emitter 11 and a downstream tubular anode 38, the anode has an inlet 10 for the process gas to ignite the plasma and, further, the device is provided with magnets 4, 7 for directing and guiding the plasma through the anode tube 38 into the process chamber 43 and including a device for generating atoms, molecules or clusters of the materials for producing a layer on the substrates 31, 31", . . . , preferably an electron beam evaporator 37 from which the evaporated or sputtered material 33 can be directly applied onto the substrates 31, 31" . . . . A second plasma 60 is generated between the crucible 45 of the electron beam evaporator 37 and the anode tube 38 of the plasma source 29 by applying a potential difference between the plasma source 29 and the vacuum chamber 2.

Claims19

Dependent claims

Apparatus for coating substrates, comprising a vacuum chamber,

a substrate holder in said vacuum chamber for holding a plurality of substrates to be coated,
a first plasma source for generating a first plasma in said vacuum chamber opposite said substrate holder and comprising an electron emitter, a downstream tubular anode tube having an inlet for process gas to ignite said plasma, first magnetic means for guiding the first plasma through the anode tube, said first magnetic means comprising at least one annular magnet around said anode tube, a magnetic shield surrounding said at least one annular magnet, and a dark space shield surrounding said magnetic shield and spaced therefrom,
second magnetic means for directing the first plasma onto the surface of the substrates, and
a vaporized material source in said vacuum chamber for evaporating the material to be deposited on said substrates, said material source being adjacent said plasma source and opposite said substrate holder, said material source evaporating said material independently of said plasma generated by said plasma source.

1 more element

Apparatus for coating substrates, comprising

a vacuum chamber,
a substrate holder in said vacuum chamber for holding a plurality of substrates to be coated,
a first plasma source for generating a first plasma in said vacuum chamber opposite said substrate holder and comprising an electron emitter, a downstream tubular anode tube having an inlet for process gas to ignite said plasma, and first magnetic means for guiding the first plasma through the anode tube,
second magnetic means for directing the first plasma onto the surface of the substrates,
an electron gun and a crucible for a material to be evaporated, said electron gun and said crucible being located in said vacuum chamber adjacent said first plasma source and opposite said substrate holder, said electron gun causing secondary electrons to be emitted from said material as said material is evaporated,
a first DC-power unit having a first pole and a second pole for applying a potential difference between said anode tube and said crucible,
a magnetic shield surrounding said anode tube and conductively connected to said anode tube, and
a dark space shield surrounding the magnetic shield and having an opening providing a direct connection for said secondary electrons to said magnetic shield, thereby forming a second plasma between the crucible and the magnetic shield.

5 more elements

Dependencies are inferred from the claim text.

Apparatus for coating substrates

Life of this patent

Apparatus for coating substrates

Life of this patent

Abstract

Claims19