H01J 2237/2482
Optical means
H01J2237/2482 (Optical means) appears on 218 US grants and 243 published applications in this corpus.
Search patents in H01J- Granted patents
- 218
- Published applications
- 243
- Assignees
- 103
- Inventors
- 522
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 3 | 0 |
| 2002 | 2 | 6 |
| 2003 | 2 | 5 |
| 2004 | 5 | 7 |
| 2005 | 6 | 7 |
| 2006 | 7 | 10 |
| 2007 | 10 | 6 |
| 2008 | 6 | 19 |
| 2009 | 9 | 9 |
| 2010 | 8 | 18 |
| 2011 | 8 | 15 |
| 2012 | 19 | 13 |
| 2013 | 16 | 11 |
| 2014 | 9 | 11 |
| 2015 | 7 | 6 |
| 2016 | 14 | 7 |
| 2017 | 2 | 6 |
| 2018 | 10 | 12 |
| 2019 | 8 | 13 |
| 2020 | 16 | 13 |
| 2021 | 9 | 10 |
| 2022 | 9 | 10 |
| 2023 | 5 | 8 |
| 2024 | 9 | 6 |
| 2025 | 5 | 9 |
| 2026 | 3 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and apparatus for continuous chained energy ion implantation4 Aug 2026US 12,700,562 B2Axcelis Technologies, Inc.
- Blended energy implant9 Jun 2026US 12,651,722 B2Axcelis Technologies, Inc.
- Systems and methods for pulsed voltage contrast detection and capture of charging dynamics3 Mar 2026US 12,567,558 B2ASML Netherlands B. V.
- Specimen machining device and specimen machining method18 Nov 2025US 12,476,071 B2JEOL Ltd.
- Leveling sensor in multiple charged-particle beam inspection21 Oct 2025US 12,451,324 B2ASML Netherlands B. V.
- Method and apparatus for continuous chained energy ion implantation1 Oct 2026US 2026/0302126 A1Axcelis Technologies, Inc.
- Blended energy implant17 Sep 2026US 2026/0279718 A1Axcelis Technologies, Inc.
- Applied electron beam device and electron beam generation method3 Sep 2026US 2026/0260838 A1Hitachi High-Tech Corporation
- Substrate inspection apparatus and substrate inspection system23 Jul 2026US 2026/0213122 A1Samsung Electronics Co., Ltd.
- Tilt measurement in particle microscope systems11 Jun 2026US 2026/0162930 A1
Most cited
By later US patents
- Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus74US 6,107,637 AHitachi, Ltd. · 2000
- Lithography system73US 6,958,804 B2Mapper Lithography IP B.V. · 2005
- Method and apparatus for inspecting or measuring a sample based on charged-particle beam imaging, and a charged-particle beam apparatus44US 6,465,781 B1Hitachi, Ltd. · 2002
- Phase shift mask, method of correcting the same and apparatus for carrying out the method42US 5,358,806 AHitachi, Ltd. · 1994
- Inspection system by charged particle beam and method of manufacturing devices using the system41US 7,601,972 B2Ebara Corporation · 2009