H01J 2237/221
Image processing
H01J2237/221 (Image processing) appears on 583 US grants and 694 published applications in this corpus.
Search patents in H01J- Granted patents
- 583
- Published applications
- 694
- Assignees
- 138
- Inventors
- 1,293
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 4 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 2 |
| 2002 | 1 | 6 |
| 2003 | 9 | 8 |
| 2004 | 6 | 11 |
| 2005 | 12 | 12 |
| 2006 | 12 | 25 |
| 2007 | 11 | 23 |
| 2008 | 24 | 33 |
| 2009 | 15 | 24 |
| 2010 | 19 | 11 |
| 2011 | 19 | 25 |
| 2012 | 22 | 21 |
| 2013 | 24 | 25 |
| 2014 | 23 | 19 |
| 2015 | 24 | 38 |
| 2016 | 31 | 35 |
| 2017 | 33 | 27 |
| 2018 | 24 | 28 |
| 2019 | 32 | 41 |
| 2020 | 41 | 44 |
| 2021 | 41 | 43 |
| 2022 | 38 | 38 |
| 2023 | 27 | 40 |
| 2024 | 23 | 39 |
| 2025 | 27 | 45 |
| 2026 | 27 | 31 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Few-shot learning for processing microscopy images15 Sep 2026US 12,737,867 B2FEI Company
- Hybrid background extraction in electron holography15 Sep 2026US 12,738,444 B2FEI Company
- Charged particle beam device25 Aug 2026US 12,719,010 B2Hitachi High-Tech Corporation
- Method for beam interference compensation based on computer vision4 Aug 2026US 12,700,070 B2FEI Company
- Defect inspection apparatus7 Jul 2026US 12,676,284 B2Hitachi High-Tech Corporation
- Systems and methods for optimizing scanning of samples in inspection systems8 Oct 2026US 2026/0311960 A1ASML Netherlands B. V.
- Method for measuring overlay using scanning electron microscope device1 Oct 2026US 2026/0301156 A1Samsung Electronics Co., Ltd.
- Image grabbing mapping method to improve system productivity in a system with multiple electron beams24 Sep 2026US 2026/0290745 A1KLA Corporation
- Method for finding optimal image contrast when using a laser phase plate17 Sep 2026US 2026/0279719 A1FEI Company
- Charged Particle Beam Apparatus and Sample Processing Method27 Aug 2026US 2026/0255914 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Method of detecting defects in patterned substrates227US 6,252,412 B1Schlumberger Technologies, Inc. · 2001
- Semiconductor device tester which measures information related to a structure of a sample in a depth direction96US 6,768,324 B1Fab Solutions, Inc. · 2004
- Pattern inspection apparatus and electron beam apparatus86US 5,430,292 AFujitsu Limited · 1995
- Detection of defects in patterned substrates71US 7,253,645 B2APPLIED Materials.Inc. · 2007
- Image-formation apparatus using charged particle beams under various focus conditions68US 6,538,249 B1Hitachi, Ltd. · 2003