H01J 2237/223
Fourier techniques
H01J2237/223 (Fourier techniques) appears on 66 US grants and 77 published applications in this corpus.
Search patents in H01J- Granted patents
- 66
- Published applications
- 77
- Assignees
- 37
- Inventors
- 175
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 2 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 2 | 4 |
| 2007 | 1 | 3 |
| 2008 | 4 | 4 |
| 2009 | 1 | 2 |
| 2010 | 4 | 1 |
| 2011 | 0 | 4 |
| 2012 | 2 | 2 |
| 2013 | 2 | 1 |
| 2014 | 2 | 1 |
| 2015 | 3 | 2 |
| 2016 | 3 | 4 |
| 2017 | 4 | 5 |
| 2018 | 5 | 0 |
| 2019 | 0 | 2 |
| 2020 | 2 | 5 |
| 2021 | 2 | 5 |
| 2022 | 4 | 4 |
| 2023 | 2 | 9 |
| 2024 | 6 | 6 |
| 2025 | 4 | 6 |
| 2026 | 6 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and apparatus for reconstructing atomic spatial distribution and electron beam function9 Jun 2026US 12,651,036 B2Tsinghua University
- SEM image enhancement methods and systems19 May 2026US 12,633,495 B2ASML Netherlands B. V.
- Method and scanning transmission charged-particle microscope12 May 2026US 12,626,884 B2FEI Company
- Automatic electron beam calibration on periodic nanostructures28 Apr 2026US 12,614,693 B2Snap Inc.
- Charged particle microscope for examining a specimen, and method of determining an aberration of said charged particle microscope21 Apr 2026US 12,609,270 B2FEI Company
- Automatic electron beam calibration on periodic nanostructures23 Jul 2026US 2026/0213121 A1Snap Inc.
- Collation system28 May 2026US 2026/0148929 A1NEC Corporation
- Pattern inspection system and method of pattern inspection using the same29 Jan 2026US 2026/0031301 A1Samsung Electronics Co., Ltd.
- System and method for image resolution characterization25 Dec 2025US 2025/0391011 A1ASML Netherlands B. V.
- Automatic electron beam calibration on periodic nanostructures20 Nov 2025US 2025/0357075 A1Snap Inc.
Most cited
By later US patents
- Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication24US 7,366,620 B2Hitachi High-Technologies Corporation · 2008
- Automatic focus control method and automatic focus control system having in focus and out of focus states detection15US 6,114,681 AKabushiki Kaisha Toshiba · 2000
- Method for particle wave reconstruction in a particle-optical apparatus14US 5,654,547 AU. S. Philips Corporation · 1997
- Method for measuring and analyzing surface roughness on semiconductor laser etched facets9US 5,460,034 AThe United States of America as represented by the Secretary of the Air Force · 1995
- Electron/ion microscope with improved resolution9US 5,500,527 A1996