H01J 2237/188
Differential pressure
H01J2237/188 (Differential pressure) appears on 135 US grants and 157 published applications in this corpus.
Search patents in H01J- Granted patents
- 135
- Published applications
- 157
- Assignees
- 83
- Inventors
- 338
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 3 | 2 |
| 2003 | 2 | 5 |
| 2004 | 7 | 5 |
| 2005 | 3 | 5 |
| 2006 | 4 | 4 |
| 2007 | 3 | 9 |
| 2008 | 4 | 8 |
| 2009 | 7 | 9 |
| 2010 | 2 | 9 |
| 2011 | 6 | 6 |
| 2012 | 8 | 6 |
| 2013 | 4 | 5 |
| 2014 | 11 | 5 |
| 2015 | 8 | 14 |
| 2016 | 5 | 8 |
| 2017 | 10 | 5 |
| 2018 | 5 | 5 |
| 2019 | 4 | 2 |
| 2020 | 4 | 3 |
| 2021 | 2 | 5 |
| 2022 | 6 | 7 |
| 2023 | 1 | 9 |
| 2024 | 3 | 7 |
| 2025 | 7 | 8 |
| 2026 | 5 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- High-performance adaptable sampling system14 Jul 2026US 12,683,135 B2Tokyo Electron Limited
- Focused ion beam system26 May 2026US 12,640,335 B2V Technology Co., Ltd.
- Electron gun chamber for scanning electron microscope, electron gun containing same, and scanning electron microscope19 May 2026US 12,633,493 B2National Institute for Materials Science
- Differential pumping apparatus and focused charged particle beam system17 Feb 2026US 12,555,739 B2V Technology Co., Ltd.
- Process apparatus including differential pumping device and focused ion beam column27 Jan 2026US 12,537,164 B2V Technology Co., Ltd.
- High-performance adaptable sampling system1 Oct 2026US 2026/0302145 A1Tokyo Electron Limited
- Method for operating a particle beam system, and particle beam system13 Aug 2026US 2026/0237592 A1
- Charged particle apparatus with improved vacuum chamber23 Jul 2026US 2026/0213129 A1ASML Netherlands B. V.
- Switching between vacuum-pressure operation and near-atmospheric-pressure operation in a material analysis system14 May 2026US 2026/0135073 A1SPECS Surface Nano Analysis GmbH
- Electron gun and electron microscope30 Apr 2026US 2026/0120990 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Charged particle beam lithography machine incorporating localized vacuum envelope75US 4,607,167 AVarian Associates, Inc. · 1986
- Method and apparatus for improved processing with a gas-cluster ion beam56US 7,060,989 B2Epion Corporation · 2006
- Localized vacuum apparatus and method53US 5,103,102 AMicrion Corporation · 1992
- Electron beam source employing a photo-emitter cathode37US 4,820,927 AControl Data Corporation · 1989
- Particle beam system32US 8,598,525 B2Carl Zeiss Microscopy GmbH · 2013